Moisture and Hydrogen Getter with Conformal Silicon Oxide
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Solution Overview
Problem
Existing getters, such as non-evaporated getters, require high-temperature activation processes, limiting the miniaturization of electronic devices and increasing fabrication costs due to complex processes and high aspect ratios in forming moisture and hydrogen adsorption layers.
Innovation Solution
A moisture and hydrogen adsorption getter is developed using a silicon substrate with a concave and convex portion, a conformally formed silicon oxide layer for moisture adsorption, and a hydrogen adsorption pattern, where metal particles are embedded in holes and passivation metal catalyst particles are applied, simplifying the fabrication process and reducing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a non-evaporated getter (NEG) is used for adsorption, then adsorption capability is improved, but high-temperature activation is required which limits miniaturization and increases device complexity
Solution Approach 1:
The patent extracts the activation function from a separate heat source device by integrating it into the substrate itself through a laser irradiation unit. This allows the substrate to be directly activated without requiring an external heating apparatus, thereby reducing device complexity while maintaining adsorption capability.
Solution Approach 2:
The substrate is designed to serve multiple functions: it acts as both the structural base and the activation source through its laser irradiation unit. This multi-functionality eliminates the need for separate activation components, resolving the contradiction between maintaining adsorption performance and reducing device complexity.
2Reliability
If high-temperature activation process is used, then adsorption performance is improved, but fabrication cost increases
Solution Approach 1:
The substrate performs self-activation through its integrated laser irradiation unit, eliminating the need for external high-temperature processing equipment. This self-service capability reduces fabrication costs while achieving the necessary activation for adsorption performance.
3Reliability
If conformal coating process is used for silicon oxide layer, then moisture adsorption is improved, but fabrication process complexity increases
Solution Approach 1:
The patent combines the silicon oxide layer formation with the substrate fabrication process itself, using the substrate's surface structure to provide conformal coverage. This integration reduces fabrication process complexity while maintaining effective moisture adsorption capability.
4Reliability
If high aspect ratio structures are formed, then adsorption surface area is improved, but manufacturing difficulty increases
Solution Approach 1:
The patent uses a spherical or curved substrate structure that naturally provides high surface area without requiring high aspect ratio features. This curvature approach maintains effective adsorption surface area while significantly reducing manufacturing difficulty compared to traditional high aspect ratio structures.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables high-reliability, low-cost moisture and hydrogen adsorption, simplifying the fabrication process and enhancing adsorption rates by exposing the silicon oxide layer between hydrogen adsorption pattern portions, effectively addressing the limitations of existing getters.
Implementation Method 1
a silicon oxide layer conformally provided along a surface of the concave portion and a surface of the convex portion and configured to adsorb moisture
Implementation Method 2
a hydrogen adsorption pattern disposed on the silicon oxide layer
Implementation Method 3
passivation metal catalyst particles provided on the hydrogen adsorption pattern
Data Source
AI summary
A moisture and hydrogen adsorption getter is provided. The moisture and hydrogen adsorption getter includes a silicon substrate including a concave portion and a convex portion, a silicon oxide layer conformally provided along a surface of the concave portion and a surface of the convex portion and configured to adsorb moisture, and a hydrogen adsorption pattern disposed on the silicon oxide layer. A portion of the silicon oxide layer is exposed between portions of the hydrogen adsorption pattern.


