Glass Substrate Carrier with Conical Recesses for Low-Absorption Support
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Solution Overview
Problem
Existing glass substrate processing techniques face challenges in creating precise, durable, and efficient structures for handling substrates during laser-induced deep etching, particularly in maintaining minimal contact area and preventing radiation absorption and ablation.
Innovation Solution
A glass substrate carrier with a structured surface featuring conical recesses and through-holes, manufactured using laser-induced deep etching and wet-chemical treatment, which allows for minimal contact and effective distribution of negative pressure, while preventing radiation absorption through micro-structured surfaces and conductive coatings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a flat glass substrate carrier is used for substrate processing, then the substrate can be supported, but the contact area is large causing radiation absorption and ablation
Solution Approach 1:
The flat substrate support surface is segmented into multiple conical recesses and through-holes, reducing the continuous contact area to discrete points while maintaining substrate fixation capability
Solution Approach 2:
The substrate carrier is transformed into a porous structure with multiple recesses and through-holes, allowing electromagnetic radiation to pass through rather than being absorbed by a continuous surface
2Reliability
If deep structures are created in glass substrate carrier, then substrate fixation is improved, but manufacturing complexity increases
Solution Approach 1:
Traditional mechanical drilling or cutting methods are replaced by laser-induced deep etching, using optical energy to create precise conical structures without mechanical contact
Solution Approach 2:
The manufacturing process utilizes controllable laser parameters (pulse duration, energy density, focal depth) to precisely control the depth and shape of conical recesses, enabling reliable substrate fixation through parameter optimization rather than complex mechanical processes
3Object-affected harmful factors
If through-holes are created in the substrate carrier, then radiation transmission is improved, but structural strength decreases
Solution Approach 1:
The through-holes are formed with conical geometry rather than cylindrical shapes, distributing stress more effectively around the openings while maintaining radiation transmission capability
Solution Approach 2:
The substrate carrier exhibits local quality variations with dense, strong regions between conical recesses and through-holes, while the recessed areas provide radiation transmission pathways, creating an optimized balance between strength and transparency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables precise positioning and fixation of substrates with minimal contact area, enhanced durability against radiation, and reduced absorption, ensuring efficient processing of thin substrates with uniform pressure distribution and static charge dissipation.
Implementation Method 1
LIDE (Laser Induced Deep Etching) for the creation of deep structures
Implementation Method 2
a process for precision machining of glass using laser-induced deep etching has become known as LIDE
Implementation Method 3
the modified regions of the glass substrate due to the action of an etching medium by successive etching
Implementation Method 4
a transparent material, for example a glass plate, is modified by means of a laser pulse or a pulse train over an elongated region along the beam axis, often over the entire thickness of the transparent material, and is then anisotropically etched in a wet-chemical etching bath
Implementation Method 5
conductive coatings
Data Source
AI summary
A substrate carrier made of glass for processing a transparent or transmissive substrate by electromagnetic radiation includes a first upper side serving as a substrate support and a lower side facing away from the upper side. The substrate support and/or the lower side of the substrate carrier has a structuring produced by modifications in the substrate carrier and a material removal by action of an etching medium in respective regions of the modifications in the substrate carrier. The structuring has a plurality of adjacent and/or merging conical recesses. At least one of the conical recesses is configured as a through-hole of the substrate carrier between the substrate support and the lower side, and a plurality of other ones of the conical recesses are configured as depressions.


