Glossy Display Panel Binding Structure Against Etching Damage
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Solution Overview
Problem
The existing manufacturing processes for glossy display panels face challenges with low production yield due to the difficulty in controlling dry etching, which leads to over-etching of the conductive pattern under the glossy reflection layer, disrupting the normal shape of the film layer.
Innovation Solution
The implementation of a glossy display panel design that uses a first insulating layer with a via hole to cover the conductive pattern, preventing etching during the wet etching process of the glossy reflection layer, ensuring the shape and reliability of the conductive pattern and improving manufacturing yield.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If dry etching is used to pattern the glossy reflection layer, then the glossy reflection layer can be formed, but the conductive pattern under the glossy reflection layer is over-etched, disrupting the normal shape of the film layer
Solution Approach 1:
An insulating layer is introduced as an intermediary between the conductive pattern and the glossy reflection layer. This insulating layer protects the conductive pattern from over-etching during the wet etching process of the glossy reflection layer, while still allowing the etching to proceed effectively. The insulating layer acts as a mediator that prevents direct contact between the etchant and the conductive pattern, thus maintaining the integrity of the conductive pattern while enabling the formation of the glossy reflection layer.
2Ease of manufacture
If wet etching is used to form the glossy reflection layer, then the glossy reflection layer can be formed, but the conductive pattern is damaged due to over-etching
Solution Approach 1:
The insulating layer serves as a protective intermediary that enables the use of wet etching for forming the glossy reflection layer without damaging the conductive pattern. The wet etching process can proceed effectively to form the desired glossy reflection layer, while the insulating layer prevents the etchant from attacking the conductive pattern, thus maintaining manufacturing precision.
Solution Approach 2:
The insulating layer is formed in advance before the glossy reflection layer is created. This preliminary action of depositing the insulating layer provides pre-protection to the conductive pattern before the etching process begins, ensuring that the conductive pattern maintains its normal shape throughout the subsequent wet etching of the glossy reflection layer.
3Device complexity
If the glossy reflection layer is formed directly on the conductive pattern, then the structure is simplified, but the conductive pattern cannot be protected from etching damage
Solution Approach 1:
The insulating layer is introduced as a protective intermediary between the conductive pattern and the glossy reflection layer. Although this adds an additional layer to the structure, it provides essential protection to the conductive pattern from etching damage. The insulating layer acts as a buffer that prevents direct exposure of the conductive pattern to the etching process, thereby improving reliability.
Data Source
AI summary
A glossy display panel, a manufacturing method thereof and a display device are provided. The glossy display panel includes a display area and a non-display area; wherein the non-display area includes a binding area, and the glossy display panel includes a first conductive pattern located on a base substrate and located in the binding area; a first insulating layer covering the first conductive pattern, wherein the first insulating layer is provided with a first via hole, and an orthographic projection of the first via hole onto the base substrate is located within an orthographic projection of the first conductive pattern onto the base substrate; a glossy reflection layer, wherein an orthographic projection of the glossy reflection layer onto the base substrate does not overlap with an orthographic projection of the binding area onto the base substrate; and a chip on film.