GLV Digital Exposure Device Pattern Width Control
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Solution Overview
Problem
Digital exposure devices face challenges in achieving high resolution and uniform pattern formation on substrates without photomasks, particularly as substrates grow larger and patterns become smaller, with existing GLV and DMD technologies struggling to maintain precise control over pattern width and thickness.
Innovation Solution
The implementation of a digital exposure device with a grating light valve (GLV) and digital micro-mirror device (DMD) that includes a stage for substrate movement, optical systems for light filtration and focusing, and control units to adjust ribbon positions and voltages for precise diffraction and beam spot modulation, allowing for controlled pattern formation with improved resolution and uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If digital exposure devices use existing GLV or DMD technologies without photomasks, then substrate processing capability is improved, but resolution and pattern uniformity deteriorate
Solution Approach 1:
The patent segments the light modulation function into multiple independent ribbons within the GLV structure. Each ribbon can be independently controlled to diffract light at specific angles, allowing precise spatial separation of pattern elements. This segmentation enables high-resolution patterning across large substrates by dividing the overall pattern into controllable segments corresponding to individual ribbons or ribbon groups.
Solution Approach 2:
The patent implements local quality control by enabling independent voltage control of each ribbon or ribbon group in the GLV. This allows different regions of the device to have different diffraction characteristics optimized for their specific function. The control unit can apply different voltages to different ribbons to create locally optimized diffraction patterns, ensuring uniform pattern formation across the entire substrate area while maintaining high resolution.
2Quantity of substance
If pattern size is reduced to increase density, then substrate capacity is improved, but control precision over pattern width and thickness deteriorates
Solution Approach 1:
The patent replaces traditional mechanical photomask systems with an electrically controlled GLV diffraction system. Instead of physically moving or adjusting mechanical masks to control pattern dimensions, the invention uses electrical voltage control of ribbon positions to dynamically adjust diffraction angles and pattern characteristics. This substitution enables precise control of pattern width and thickness at reduced sizes through electrical signals rather than mechanical adjustments, maintaining control precision while increasing pattern density.
Solution Approach 2:
The patent utilizes parameter changes in the diffraction process by varying voltage levels applied to the ribbons. By changing the voltage parameter, the ribbon positions and diffraction angles are dynamically adjusted, allowing precise control over pattern width and thickness. This parameter-based control enables high-precision patterning at reduced feature sizes, as small voltage changes produce corresponding changes in diffraction patterns, providing fine control without requiring proportionally smaller physical structures.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables the formation of smaller patterns with improved resolution and uniform pattern width and thickness, overcoming limitations in existing technologies by precisely controlling light diffraction and beam spot sizes and energies, even with negative photoresists.
Implementation Method 1
a GLV configured with one pair of ribbons and turns the GLV on/off through an optical interference phenomenon occurring when incident light is diffracted by a position difference between the two ribbons
Implementation Method 2
turns the GLV on/off through an optical interference phenomenon occurring when incident light is diffracted by a position difference between the two ribbons
Implementation Method 3
an optical system disposed between the stage and the GLV in the first direction and configured to filter and focus the diffracted light, so as to form a pattern on the substrate
Implementation Method 4
a plurality of micro mirrors reflect a light, which is incident a predetermined angle, at a desired angle, and other light at a different angle, so that only selected light is exposed
Data Source
AI summary
A digital exposure device including a GLV or a DMD. The digital exposure device also includes: a stage to support and move a substrate in a scan direction; an optical system disposed between the stage and the GLV or the DMD, to form a pattern on the substrate by modulating light received from the GLV or the DMD; and a control unit to control the a width of the pattern by a unit, the unit being obtained by dividing the width of the pattern by a natural number m, in the second direction.