Glyceryl Ether Rinse Composition to Prevent Micropattern Collapse
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Solution Overview
Problem
Existing rinse compositions cause damage to photoresist patterns and lead to pattern collapse during the rinsing process, especially for micropatterns with high aspect ratios, failing to provide effective cleaning without deforming the pattern.
Innovation Solution
A rinse composition containing a glyceryl ether compound represented by Chemical Formula 1, which lowers surface tension to reduce capillary forces and prevent pattern collapse, while using water-soluble organic solvents for enhanced cleaning without damaging the photoresist pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a rinse composition with strong cleaning power is used to remove development residue, then cleaning performance is improved, but the photoresist pattern is damaged and deformed
Solution Approach 1:
The patent changes the chemical parameters of the rinse composition by specifying precise pH ranges (pH 6.5-7.5) and using specific surfactant types (nonionic surfactants with HLB values of 10-16) to achieve effective cleaning while preventing photoresist damage. This parameter optimization resolves the contradiction between cleaning power and pattern integrity.
Solution Approach 2:
The rinse composition uses a composite formulation combining multiple components: nonionic surfactants, cationic surfactants, buffers, and chelating agents. This composite approach provides both strong cleaning capability through synergistic action and gentle handling of photoresist patterns through pH control and selective surface activity.
2Object-affected harmful factors
If deionized water is used for rinsing, then pattern collapse is prevented, but cleaning power is insufficient to remove development residue
Solution Approach 1:
The patent introduces surfactants as intermediary substances that mediate between water and the hydrophobic development residue. The surfactants lower surface tension and enable effective residue removal while the buffer system maintains pH levels that prevent pattern collapse, combining the benefits of both deionized water and cleaning agents.
Solution Approach 2:
The rinse composition modifies water properties by adjusting surface tension through surfactant addition and pH through buffer systems. These parameter changes enable the solution to have both the gentle handling characteristics of deionized water and the strong cleaning power needed to remove organic development residue.
3Manufacturing precision
If a developing solution is used to remove development residue, then residue cleaning is achieved, but pattern collapse occurs during drying due to capillary force
Solution Approach 1:
The patent extracts and addresses the capillary force problem by using surfactants that specifically reduce surface tension during the rinse and drying processes. This extraction of the harmful capillary force mechanism allows effective residue removal without the pattern collapse that occurs with conventional developing solutions.
Solution Approach 2:
Surfactants act as intermediaries that replace the harmful capillary forces of developing solutions with gentle surface tension reduction. The buffer system serves as another intermediary to maintain pH stability, enabling residue removal while preventing the pattern collapse that plagues conventional drying processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively prevents pattern collapse and minimizes damage to micropatterns, improving the overall process yield by maintaining the integrity of the photoresist pattern during the rinsing and drying processes.
Implementation Method 1
a rinse composition including a glyceryl ether compound represented by Chemical Formula 1... capable of obtaining excellent rinse performance and minimizing damage to the photoresist pattern while preventing a collapse of the micropattern
Implementation Method 2
a pattern collapse occurs in a drying process by capillary force of water droplets pulling a micropattern
Data Source
AI summary
The present disclosure provides a rinse composition including a glyceryl ether compound represented by Chemical Formula 1, and a method for manufacturing a device using the same.