Graphene Film Formation Using Coal Carbon Sources
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Solution Overview
Problem
The high cost and difficulty in mass-producing graphene films due to the expensive nature of conventional carbon sources limit their widespread application and scalability.
Innovation Solution
A method is developed to form graphene films using coal or coal components as carbon sources within a vacuum deposition environment, involving evacuation, heat, and flush cycles, and using a chemical vapor deposition system to deposit the carbon source onto a substrate, ensuring a controlled atmosphere with low oxygen concentration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional carbon sources are used to form graphene films, then the quality and properties of graphene films are maintained, but the cost and difficulty of mass production increase
Solution Approach 1:
The patent replaces expensive conventional carbon sources with cheap, readily available carbon sources such as coal dust, soot, or carbon black. These inexpensive carbon sources are used in a chemical vapor deposition process to produce graphene films, thereby reducing material costs while maintaining production scalability.
2Reliability
If conventional carbon sources are used to form graphene films, then the properties of graphene films are maintained, but the scalability and efficiency of production decrease
Solution Approach 1:
The patent modifies the deposition parameters including using a temperature range of 700-1000°C, controlling vacuum pressure between 1-100 mTorr, and adjusting carbon source flow rates to optimize the conversion of inexpensive carbon sources into high-quality graphene films while enabling scalable production.
Solution Approach 2:
By utilizing inexpensive carbon sources like coal dust, soot, or carbon black instead of expensive conventional carbon sources, the patent enables cost-effective and scalable graphene production while maintaining film quality through optimized deposition conditions.
3Reliability
If expensive carbon sources are used, then the quality of graphene films is maintained, but the cost of production increases
Solution Approach 1:
The patent substitutes expensive conventional carbon sources with inexpensive alternatives such as coal dust, soot, or carbon black. These cheap carbon sources are processed through chemical vapor deposition to produce graphene films of comparable quality, thereby significantly reducing material costs.
Solution Approach 2:
By optimizing deposition parameters including temperature (700-1000°C), pressure (1-100 mTorr), and gas flow rates, the patent achieves high-quality graphene films from inexpensive carbon sources, resolving the contradiction between material cost and film quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the efficient production of high-quality graphene films, scalable for large quantities, using readily available and cost-effective carbon sources like coal, while maintaining the integrity and properties of graphene films.
Implementation Method 1
depositing a carbon source onto a substrate within a deposition environment including a vacuum to form the graphene film on the substrate
Implementation Method 2
The carbon source includes particulate coal having a largest dimension smaller than 100 microns, a particulate component extracted from coal having a largest dimension smaller than 100 microns, or a combination thereof, onto a substrate a metal or an alloy thereof within the deposition environment including a vacuum of 1 kPa to 20 kPa
Implementation Method 3
performing at least one evacuation/flush cycle at room temperature including evacuating the deposition environment to 1 kPa to 90 kPa
Implementation Method 4
performing at least one heat/flush/evacuation cycle of the deposition environment including heating the deposition environment to 300° C. to 1000° C.
Implementation Method 5
The method includes depositing a carbon source including particulate coal having a largest dimension smaller than 100 microns... onto a substrate a metal or an alloy thereof within the deposition environment including a vacuum of 1 kPa to 20 kPa to form the graphene film on the substrate. The deposition environment has an oxygen concentration of ≤0.01 vol %. The deposition includes cooling the deposition environment from an initial temperature of 800° C. to 1200° C.
Data Source
AI summary
Methods and apparatuses for forming a graphene film, and graphene films produced thereby. A method of forming a graphene film includes depositing a carbon source onto a substrate within a deposition environment including a vacuum to form the graphene film on the substrate. The carbon source includes coal, a coal component, or a combination thereof.