Graphene Interface for Diamond Nitride Heat Dissipation

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Solution Overview

Problem

The manufacturing cost of nitride semiconductor devices is increased due to the need to remove the heteroepitaxial growth substrate through grinding and chemical mechanical polishing, which is necessary for transferring the nitride semiconductor layer onto a diamond substrate to enhance heat dissipation properties.

Innovation Solution

A nitride semiconductor device is fabricated by forming a graphene layer on a diamond substrate, followed by a nitride semiconductor layer, with additional graphene layers acting as an interface to bond the nitride semiconductor layer to the diamond substrate, eliminating the need for substrate removal and reducing manufacturing costs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If the heteroepitaxial growth substrate is removed through grinding and CMP to transfer the nitride semiconductor layer onto a diamond substrate, then the heat dissipation property is improved, but the manufacturing cost increases

Engineering Contradiction:
Improveheat dissipation propertyVSAvoidmanufacturing cost
Core Design Contradiction:
TemperatureVSEase of manufacture

Solution Approach 1:

A graphene layer is introduced as an intermediary between the nitride semiconductor layer and the diamond substrate. This graphene layer serves as a bonding interface that enables direct transfer of the nitride semiconductor layer onto the diamond substrate without requiring removal of the heteroepitaxial growth substrate through grinding and CMP processes, thereby reducing manufacturing costs while maintaining excellent heat dissipation properties

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention changes the bonding interface parameters by using a graphene layer with specific properties (single-atom thickness, high thermal conductivity, lattice matching) instead of traditional amorphous carbon layers or direct bonding methods. This parameter change enables effective thermal transport while simplifying the manufacturing process

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If a graphene layer is used as the bonding interface between the nitride semiconductor layer and the diamond substrate, then the manufacturing cost is reduced, but the thermal conductivity may be compromised

Engineering Contradiction:
Improvemanufacturing costVSAvoidthermal conductivity
Core Design Contradiction:
Ease of manufactureVSLoss of energy

Solution Approach 1:

The invention optimizes the graphene layer parameters by controlling its thickness to be substantially uniform and within a specific range (preferably 1-10 layers), and by ensuring high crystallinity with minimal defects. These parameter changes maintain extremely high thermal conductivity (comparable to or exceeding bulk diamond) while enabling cost-effective manufacturing through simplified bonding processes

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention creates a composite interface structure consisting of the graphene layer bonded to both the nitride semiconductor layer and the diamond substrate. This composite structure leverages the complementary properties of graphene (high in-plane thermal conductivity, flexibility, lattice matching) and diamond (extreme thermal conductivity, mechanical strength) to achieve superior overall thermal management performance

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device achieves high heat dissipation properties at a lower cost by utilizing graphene layers with minimal lattice defects and high thermal conductivity, enhancing thermal transport between the nitride semiconductor layer and the diamond substrate.

Implementation Method 1

utilizing graphene layers with minimal lattice defects and high thermal conductivity, enhancing thermal transport between the nitride semiconductor layer and the diamond substrate

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Implementation Method 2

the interface layer is formed by bonding the first graphene layer and the second graphene layer to each other

Methodology Applied
Scientific EffectBonding: Chemical Bonding

Data Source

PatentUS12476165B2Nitride semiconductor device, and method of manufacturing nitride semiconductor device
Publication Date: 2025.11.18 MITSUBISHI ELECTRIC CORP
  • US12476165B2 patent drawing
  • US12476165B2 patent drawing
  • US12476165B2 patent drawing

AI summary

A nitride semiconductor device includes: a diamond substrate; a first graphene layer provided on the diamond substrate; a second graphene layer provided on the first graphene layer; a nitride semiconductor layer provided on the second graphene layer; and a nitride semiconductor element having an electrode provided on the nitride semiconductor layer, wherein the first and second graphene layers are provided as an interface layer between the diamond substrate and the nitride semiconductor layer.