Graphene Edge Chemical Modification via Dry Etching

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Solution Overview

Problem

Existing methods for modifying graphene edges to alter electrical properties are limited, and there is a need for a process that can efficiently introduce functional groups to graphene edges to enhance its applications in devices such as sensors and field-effect transistors.

Innovation Solution

A method involving dry etching of graphene edges followed by introduction of functional groups using a composition capable of providing hydroxide ions, such as water or steam, to modify the electrical properties of graphene.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If graphene edges are chemically modified to alter electrical properties, then electrical properties and device functionality are improved, but the manufacturing process complexity increases

Engineering Contradiction:
Improveelectrical propertiesVSAvoidmanufacturing process
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies preliminary action by first etching the graphene edges to create reactive sites, then subsequently introducing functional groups. This two-step approach prepares the graphene surface in advance for functionalization, making the electrical property modification more controllable and efficient while managing process complexity.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent utilizes parameter changes by controlling the etching conditions (power, time, gas flow) and functionalization parameters (temperature, exposure time, reagent concentration) to precisely tune the electrical properties of graphene. By adjusting these parameters, the desired electrical characteristics can be achieved while optimizing the manufacturing process.

Inventive Principle:
Principle #35Parameter changes

2Adaptability or versatility

If functional groups are introduced at graphene edges, then electrical properties are modified for device applications, but the manufacturing precision requirements increase

Engineering Contradiction:
Improveelectrical propertiesVSAvoidfunctional group introduction
Core Design Contradiction:
Adaptability or versatilityVSManufacturing precision

Solution Approach 1:

The patent applies local quality by specifically targeting the edges of graphene for functionalization rather than the entire surface. The etching process creates localized reactive sites at the edges, and subsequent functional group introduction occurs preferentially at these locations. This localized approach enables precise control over where functional groups are introduced, improving manufacturing precision while achieving the desired electrical property modifications.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively alters the electrical properties of graphene, enabling its use in various devices by introducing functional groups like carbonyl, carboxyl, and hydroxyl groups, thereby modifying its metallic or semiconductor characteristics, resistance, and band gap.

Implementation Method 1

dry etching graphene to provide graphene having an etched edge

Methodology Applied
Scientific EffectDry etching:

Implementation Method 2

introducing a functional group at the etched graphene edge using a composition capable of providing hydroxide ions, such as water or steam

Methodology Applied
Scientific EffectChemical reaction with hydroxide ions:

Data Source

PatentUS9988274B2Method for chemical modification of a graphene edge, graphene with a chemically modified edge and devices including the graphene
Publication Date: 2018.06.05 SAMSUNG ELECTRONICS CO LTD
  • US9988274B2 patent drawing
  • US9988274B2 patent drawing
  • US9988274B2 patent drawing

AI summary

A method for chemical modification of graphene includes dry etching graphene to provide an etched graphene; and introducing a functional group at an edge of the etched graphene. Also disclosed is graphene, including an etched edge portion, the etched portion including a functional group.