Graphene Filter Production via Low-Temperature Oxidation
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Solution Overview
Problem
Conventional methods for producing filter molded articles with graphene water passage holes are inefficient, requiring multiple steps, consuming chemicals, and prone to breaking the thin graphene, with difficulty in controlling hole size and uniformity, leading to contamination and low productivity.
Innovation Solution
A method involving forming a support layer on a graphene, exposing and developing photoresist to create water passage holes, and heating the graphene at a low temperature in air containing oxygen to form uniform holes without breaking the support, using a negative photoresist to avoid transfer steps and control hole size effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the graphene is heated at a high temperature of about 300 to 500° C. to form water passage holes, then holes are opened in the graphene, but the film resist supporting the graphene is broken and the sizes of the water passage holes are not uniform
Solution Approach 1:
The patent changes the heating temperature parameter from the conventional high temperature range (300-500°C) to a lower temperature range (100-300°C). This parameter change allows the formation of water passage holes in the graphene while preventing breakdown of the film resist support structure, thereby achieving uniform hole sizes without damaging the supporting infrastructure.
2Productivity
If the conventional transfer step is used to transfer graphene to a support, then the graphene can be transferred, but chemicals are consumed, time is consumed, and productivity is low
Solution Approach 1:
The patent extracts and eliminates the conventional transfer step from the production process. By forming the graphene directly on the film resist support structure and heating it in situ, the method removes the need for separate transfer operations involving PMMA coating, copper foil etching, and multiple handling steps, thereby significantly improving productivity and reducing time consumption.
Solution Approach 2:
The patent merges the graphene formation and support structure integration into a single step. The graphene is formed directly on the film resist which serves as both the support and the template for water passage hole formation, eliminating the need for separate transfer and support attachment steps.
3Reliability
If the graphene is handled during transfer and coating steps, then the graphene can be positioned on a support, but the extremely thin graphene may be broken
Solution Approach 1:
The patent performs preliminary action by forming the graphene directly on the final support structure (film resist) before any hole formation or processing steps. This preliminary integration ensures the graphene is securely supported throughout subsequent processing, preventing breakage during handling while eliminating the need for complex transfer operations.
4Manufacturing precision
If combustion reaction is used to open holes in graphene, then holes are formed, but cinders of the support may contaminate the graphene to lower performance
Solution Approach 1:
The patent changes the heating temperature parameter to a lower range (100-300°C) that is sufficient to form water passage holes in the graphene through controlled oxidation but below the temperature that causes combustion of the film resist support. This prevents cinder generation and contamination of the graphene, maintaining its purity and filtration performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for the controlled formation of uniform water passage holes in graphene at a low temperature, preventing breakage and contamination, and increasing the productivity of filter molded articles with improved ion selectivity and filtration efficiency.
Implementation Method 1
forming water passage holes by heating and holding the graphene layer at a low temperature in the air containing oxygen of 160 to 250° C. for a predetermined time
Implementation Method 2
exposing and developing photoresist to create water passage holes
Data Source
AI summary
A filter molded article using a graphene with water passage holes having a desired size is produced in a simple step.A method for producing a filter molded article having a graphene layer as a filtering material is characterized by including a step of forming a support 3 layer on a surface of a graphene 1 layer formed on initial substrates for a graphene 2 and 9, a step of forming water passage holes in the support 3 layer, a step of removing the initial substrates for a graphene 2 and 9, and a step of forming water passage holes by heating and holding the graphene 1 layer at a low temperature in the air containing oxygen of 160 to 250° C. for a predetermined time.