Graphene Nanohole Formation via Detachable Functional Groups
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Solution Overview
Problem
Current methods for forming graphene nanoholes are limited in creating uniform, large-area nanostructures due to chemical reactions with metal atoms or organic molecules, and plasma/laser techniques struggle with size control and uniformity, making them unsuitable for industrial applications.
Innovation Solution
A dry method involving the formation of functional groups on a graphene sheet using fluorine-containing activation gases or hydrogen/oxygen plasma, followed by heat treatment to remove these groups and create nanoholes, allowing control over size, shape, and density through regulation of pressure, time, and catalysts.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If heat treatment after depositing metal atoms or organic molecules is used to form holes in graphene, then holes can be formed through chemical reaction, but it is hard to form nano-sized holes and large-area graphene
Solution Approach 1:
The patent applies preliminary action by first forming a mask pattern on the graphene sheet before performing heat treatment. This mask pattern serves as a template that guides where holes will be formed, enabling precise control over hole position and size while allowing large-area graphene to be processed. The mask is prepared in advance, then heat treatment is performed to remove the mask material, creating holes at predetermined locations.
Solution Approach 2:
The patent introduces a mask pattern as an intermediary material that mediates the hole formation process. This mask material is deposited on the graphene, then removed through heat treatment to create holes. The intermediary mask enables indirect control of hole formation, avoiding direct chemical reactions that would damage the graphene and allowing precise nanoscale hole formation across large areas.
2Manufacturing precision
If plasma or laser is used to form holes in graphene, then holes can be formed, but it is hard to keep the size of nanoholes uniform and only a small number of holes can be formed at a local portion
Solution Approach 1:
The patent applies segmentation by dividing the hole formation process into distinct steps: mask pattern formation and selective removal. The mask pattern is segmented into discrete regions that correspond to desired hole locations. This segmentation allows uniform nanoholes to be formed across the entire graphene sheet, not just at local portions, thereby increasing productivity while maintaining size uniformity.
Solution Approach 2:
The mask pattern serves multiple functions: it defines hole positions, controls hole size, and enables uniform formation across large areas. This multi-functional approach replaces the need for separate processes for each hole, allowing simultaneous formation of many uniform nanoholes across the entire graphene sheet, thus improving productivity without sacrificing uniformity.
3Quantity of substance
If chemical reaction between deposited materials and graphene is used to form holes, then holes can be formed, but it is hard to form nano-sized holes
Solution Approach 1:
The patent replaces chemical reaction mechanisms with a physical removal mechanism. Instead of using chemical reactions between deposited materials and graphene to form holes, the invention uses heat treatment to physically remove the mask material. This mechanical/physical substitution enables precise nanoscale hole formation because the mask material can be designed with exact dimensions, and its removal does not involve chemical etching that would cause size variations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the formation of uniform, controlled nanoholes with diameters of 1 nm or less, suitable for applications in filters, separators, and negative electrode materials, with the ability to form large-area graphene sheets and maintain selective permeability.
Implementation Method 1
making an activation gas containing fluorine (F) react with a graphene sheet to form a functional group-bonded region
Implementation Method 2
the process (a) may be performed by forming a functional group-bonded region without damage, using hydrogen or oxygen plasma
Implementation Method 3
heating the graphene sheet having the functional group-bonded region to remove the functional group-bonded region to form nanoholes
Data Source
AI summary
Provided is a method for forming graphene nanoholes to form nanoholes in a graphene sheet, the method comprising a process (a) of forming a functional group-bonded region in a graphene sheet, and a process (b) of heating the graphene sheet having the functional group-bonded region to remove the functional group-bonded region to form nanoholes.