Graphene Oxide Cleaning Fluid for PCB Ion Removal

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Solution Overview

Problem

Current PCB cleaning methods, such as micro-etching and ultrasonic water washing, can damage electronic components and fail to effectively remove ionic contaminants, leading to defects and failures that may not appear until months or years after fabrication, due to the corrosive nature of residual flux and ions.

Innovation Solution

Dispersing graphene oxide in a washing fluid to attract and remove ions from the surface of electronic components, combined with high-pressure jet washing and scrubbing, allows for efficient ion removal without damaging the components, and includes a system for monitoring and maintaining the ion concentration of the cleaning fluid to prevent re-contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If micro-etching and ultrasonic water washing are used to remove ionic contaminants, then cleaning effectiveness is improved, but damage to electronic components occurs

Engineering Contradiction:

Improvecleaning effectivenessVSAvoiddamage to electronic components

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent introduces a cleaning fluid as an intermediary substance that contains chelating agents and surfactants specifically designed to bind with ionic contaminants. This intermediary cleaning fluid allows for effective ion removal without the need for aggressive mechanical methods like micro-etching or ultrasonic washing that damage components.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent changes the chemical parameters of the cleaning system by formulating a specialized cleaning fluid with specific chelating agents and surfactants. This chemical parameter change enables effective ion removal through chemical binding rather than mechanical force, thereby avoiding damage to electronic components while maintaining cleaning effectiveness.

Inventive Principle:

Principle #35Parameter changes

2Reliability

If aggressive cleaning techniques are used to remove residual flux, then ion removal is improved, but defects and failures occur

Engineering Contradiction:

Improveion removal effectivenessVSAvoiddefects and failures

Core Design Contradiction:

ReliabilityVSManufacturing precision

Solution Approach 1:

The cleaning fluid serves as a gentle intermediary that chemically binds with ionic contaminants through chelating agents. This approach removes ions effectively without the mechanical aggression of traditional cleaning methods, preventing defects such as surface damage and component failure while maintaining manufacturing precision.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent replaces mechanical cleaning systems (micro-etching, ultrasonic washing) with a chemical cleaning system. The chelating agents in the cleaning fluid chemically bind with ions, substituting mechanical removal with chemical binding. This substitution eliminates the defects and failures caused by mechanical aggression while maintaining effective ion removal.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Reliability

If cleaning fluid is used to remove ions, then cleaning effectiveness is improved, but re-contamination occurs

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidre-contamination

Core Design Contradiction:

ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent implements a feedback mechanism where the cleaning fluid is continuously monitored for ion concentration. Based on this feedback, the cleaning fluid is periodically replaced or regenerated to maintain its effectiveness. This feedback loop prevents re-contamination by ensuring the cleaning fluid remains capable of effectively binding with ions throughout the cleaning process.

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The patent employs a system for discarding contaminated cleaning fluid and recovering fresh cleaning fluid. The cleaning fluid is monitored for ion saturation, and when it can no longer effectively clean, it is discarded and replaced with fresh fluid. This recovering process ensures continuous effective cleaning without re-contamination of the cleaning medium itself.

Inventive Principle:

Principle #34Discarding and recovering

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively removes ions and prevents corrosion, reducing the risk of defects and failures by maintaining the cleanliness of the PCBs throughout the manufacturing process, while minimizing damage to the components and allowing for real-time monitoring of cleaning fluid efficacy.

Implementation Method 1

dispersing graphene oxide in a washing fluid to attract and remove ions from the surface of electronic components

Methodology Applied

Scientific EffectAdsorption: Adsorption

Data Source

PatentUS11304304B2Ionic contaminant cleaning

Publication Date: 2022.04.12 INTERNATIONAL BUSINESS MACHINE CORPORATION

AI summary

Aspects of the present disclosure relate to dispersing graphene oxide in a fluid and washing a first electronic part with cleaning fluid. Aspects of the present disclosure relate to testing cleaning fluid for a concentration of ions, and determining whether the ion concentration is below a threshold. If the ion concentration is below a threshold level, continuing to wash parts with the fluid. If the ion concentration is above a threshold level, replacing the cleaning fluid.