Graphene Film Polymer Support for Clean Substrate Release
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Solution Overview
Problem
The challenge lies in forming graphene devices without damaging or degrading the graphene layer during the removal from the base substrate, particularly in achieving a three-dimensional graphene device with maintained conductivity and flexibility.
Innovation Solution
A method involving gas phase deposition of a polymer material, such as parylene, to support the graphene film, allowing for substrate removal through electrochemical delamination or acid etching, while encapsulating the graphene film to preserve its integrity and conductivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If graphene is deposited over a base substrate using CVD process, then graphene layer can be formed, but it is difficult to remove the graphene layer from the base substrate without damaging or polluting the graphene layer and degrading its conductivity
Solution Approach 1:
A polymer support layer is introduced as an intermediary between the graphene film and the base substrate. This polymer layer is deposited by gas phase deposition and serves as a temporary support that facilitates easy removal of the graphene film from the substrate without direct contact between the graphene and substrate during the removal process, thereby preventing damage and conductivity degradation
Solution Approach 2:
The system is segmented into three distinct layers: the base substrate, the polymer support layer, and the graphene film. This segmentation allows the polymer layer to be selectively removed or degraded, enabling clean separation of the graphene film from the substrate while maintaining the integrity of both the substrate and graphene film
2Ease of manufacture
If a polymer material is deposited by gas phase deposition to support the graphene film, then the graphene film can be easily removed from the substrate, but additional deposition steps are required
Solution Approach 1:
The polymer material serves multiple functions: it acts as a support layer during graphene film formation, provides a release mechanism for easy substrate removal, and can potentially serve as an encapsulation layer. This multi-functionality justifies the additional deposition step by eliminating the need for separate release and support mechanisms
3Adaptability or versatility
If the graphene film is formed over a three-dimensional surface of the substrate, then 3D graphene devices can be formed, but the graphene film formation process becomes more complex
Solution Approach 1:
The polymer support layer acts as a flexible shell that can conform to three-dimensional surfaces. This flexibility allows the graphene film to be deposited and supported on complex 3D geometries without requiring specialized deposition techniques or tools, as the polymer layer adapts to the substrate shape and provides continuous support during the process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the formation of flexible, high-conductivity graphene devices that can be easily detached from substrates without degradation, suitable for three-dimensional applications, maintaining the electrical and mechanical properties of the graphene film.
Implementation Method 1
depositing, by gas phase deposition, a polymer material covering a surface of the graphene film
Implementation Method 2
removing the substrate from the graphene film is performed by a process of electrochemical delamination
Data Source
AI summary
The invention concerns a method of forming a graphene device, the method comprising: forming a graphene film (100) over a substrate; depositing, by gas phase deposition, a polymer material covering a surface of the graphene film (100); and removing the substrate from the graphene film (100), wherein the polymer material forms a support (102) for the graphene film (100).