Graphene Transfer via Vacuum Chamber to Eliminate Bubbles
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing methods for transferring graphene often result in bubbles and foreign substances interfering with adhesion, leading to separation during metal substrate etching and reduced adhesion quality on target substrates.
Innovation Solution
A method involving the use of vacuum chambers, rollers, and etching solutions to remove protective films and apply heat and pressure for transferring graphene onto a base material film, while preventing gas entry through vacuum curtains and polymer coatings to enhance adhesion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If graphene transfer is performed in the atmosphere using a thermal release film, then the transfer process can be conducted in air, but bubbles are generated between the thermal release film and the graphene, causing separation during etching and reducing adhesion quality
Solution Approach 1:
The patent applies vacuum environment (inert atmosphere) during the graphene transfer process to eliminate air-related issues. By conducting the transfer in vacuum, bubbles are prevented from forming between the thermal release film and graphene, ensuring reliable adhesion and preventing separation during subsequent etching steps
2Productivity
If bubbles are present between the thermal release film and graphene, then the transfer can proceed, but the adhesion decreases and graphene quality deteriorates
Solution Approach 1:
The patent uses vacuum environment to prevent bubble formation during transfer, maintaining high graphene quality without compromising process continuity
Solution Approach 2:
The patent performs preliminary vacuum treatment before the transfer process to ensure no bubbles are present, preventing quality deterioration before it occurs
3Ease of operation
If bubbles are present between the graphene and target substrate, then transfer can occur, but adhesion between graphene and target substrate is impeded
Solution Approach 1:
The patent conducts the transfer process in vacuum to eliminate air bubbles that would interfere with adhesion, ensuring strong bonding between graphene and target substrate while maintaining operational simplicity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively increases adhesion and prevents graphene separation during etching, enhancing the adhesive quality on target substrates by removing bubbles and foreign substances.
Implementation Method 1
passing a metal sheet having graphene on one surface and a protective film on the graphene and a transfer receiving sheet having a protective film on one surface through respective inlet rollers in an outlet of a vacuum chamber made in a vacuum atmosphere
Implementation Method 2
At least one of heat and pressure may be applied to the transfer onto the transfer receiving sheet of the graphene
Implementation Method 3
a metal substrate, that is, a metal layer on the back surface of the graphene transferred onto the thermal release film is removed by a wet etching process
Data Source
AI summary
A method for transferring graphene according to an exemplary embodiment of the present invention includes a process of transferring graphene of a metal sheet onto a thermal release film in each vacuum chamber and a process of transferring the graphene of the thermal release film onto a base material substrate. According to the method for transferring graphene, adhesion is increased by removing bubbles or foreign substances at the time of transferring the graphene to prevent separation of the graphene at the time of etching a metal substrate and enhance an adhesive quality state of the graphene on a target substrate.