Parameterized Grating Coupler Layout for Faster Photonic Design
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Solution Overview
Problem
Current methods for generating layout geometries for optical elements in silicon photonic circuits fail to optimize for various design characterizations and do not provide parameterized layout generation techniques using scripting languages.
Innovation Solution
A scalable system and method for automated and parameterized optical element generation, specifically for generating parameterized curved patterns in optical grating couplers, using received parameters and optimized based on performance indices.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If current methods are used to generate layout geometries for optical elements, then design can be completed, but optimization for various design characterizations is not achieved and layout time is excessive
Solution Approach 1:
The patent pre-generates multiple layout geometries for optical elements with different design characteristics (e.g., coupling efficiency, bandwidth, reflectivity) and stores them in a database. During actual design, the EDA tool queries this database and retrieves pre-optimized geometries, eliminating the need for time-consuming real-time optimization while ensuring design characterization optimization is achieved.
Solution Approach 2:
The patent varies multiple geometric parameters of optical elements (such as grating coupler dimensions, waveguide widths, taper angles) to generate a comprehensive database of layout geometries optimized for different design characterizations. This parameter variation approach enables rapid selection of optimal geometries based on specific design requirements without recalculating from scratch.
2Adaptability or versatility
If current methods are used, then layout can be generated, but parameterized layout generation techniques using scripting languages are not provided
Solution Approach 1:
The patent implements a universal database interface that supports multiple scripting languages (Python, Tcl, SKILL, Ample, STP) through a common architecture. The EDA tool's database layer provides language-agnostic access to layout geometry data, allowing designers to use their preferred scripting language without increasing underlying system complexity.
3Manufacturing precision
If hand drawn complex curved shapes are used, then optimization for particular design characteristic is achieved, but design flexibility is limited
Solution Approach 1:
The patent generates layout geometries by systematically varying multiple parameters (grating periods, waveguide dimensions, coupling lengths) to create optimized shapes for different design characteristics. This parametric approach maintains manufacturing precision while enabling flexible adaptation to various design requirements through database queries and parameter adjustments.
Solution Approach 2:
The patent pre-computes and stores optimized curved shapes for various design characteristics in a database. When a specific design characteristic is needed, the pre-optimized geometry is retrieved and can be further adapted through parameter modification, combining the benefits of pre-optimized performance with design flexibility.
Data Source
AI summary
A method and system for generating a physical layout for a grating coupler integrated in a photonically-enabled circuit are disclosed herein. In some embodiments, the method receives a parametrized wavelength, a parametrized first refractive index, a parametrized second refractive index, a parametrized taper length, a parametrized width, a parametrized grating length, and a parametrized incident angle of the optical beam incident onto the grating coupler and generates a physical layout for the grating coupler based on the received parametrized inputs, the generating of the physical layout is according to a predefined model, and outputs the physical layout of the grating coupler for manufacturing under a semiconductor fabrication process.