Grating Shearing Interferometer Wavefront Aberration Detection

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current grating shearing interferometer systems face challenges in high-precision phase retrieval due to interference from high-order diffraction beams, especially for large numerical aperture systems, leading to system errors and reduced accuracy.

Innovation Solution

A method that uses a grating shearing interferometer system with a one-dimensional and two-dimensional diffraction grating plate, where the two-dimensional diffraction grating plate is moved to eliminate interference from high-order diffraction beams by determining specific phase-shifting steps based on the shear ratio and numerical aperture, allowing only interference between ±1st-order and 0th-order beams, thereby improving phase retrieval precision.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a grating shearing interferometer is used for wavefront detection, then the detection sensitivity and structure simplicity are improved, but high-order diffraction beams cause interference that reduces phase retrieval precision

Engineering Contradiction:
Improvephase retrieval precisionVSAvoidhigh-order diffraction beam interference
Core Design Contradiction:
Measurement precisionVSObject-generated harmful factors

Solution Approach 1:

The patent extracts and eliminates the harmful high-order diffraction beams from the interference field by using a double-window mask that selectively blocks these beams while allowing the useful ±1st-order and 0th-order beams to pass through for phase retrieval

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces a double-window mask as an intermediary element between the grating and the detector to mediate the interference process, filtering out harmful high-order beams while preserving the necessary beams for accurate phase retrieval

Inventive Principle:
Principle #24Intermediary (Mediator)

2Measurement precision

If a double-window mask is used to filter high-order diffraction beams, then phase retrieval precision is improved, but the mechanical structure complexity and operational convenience deteriorate when shear direction or ratio changes

Engineering Contradiction:
Improvephase retrieval precisionVSAvoidmechanical structure complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent designs a universal double-window mask that can accommodate different shear directions and ratios without requiring replacement, making the mask multi-functional and eliminating the need for mechanical changes when measurement parameters are adjusted

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Measurement precision

If existing phase retrieval algorithms are used to eliminate ±3th and ±5th-order diffraction beams, then some interference is reduced, but ±7th and higher-order diffraction beams still affect precision

Engineering Contradiction:
Improvephase retrieval precisionVSAvoid±7th and higher-order diffraction beams
Core Design Contradiction:
Measurement precisionVSObject-generated harmful factors

Solution Approach 1:

The patent physically extracts and removes all high-order diffraction beams (±3th, ±5th, ±7th, and higher orders) from the interference field using the double-window mask, not just the commonly addressed ±3th and ±5th orders, thereby completely eliminating their harmful interference effects

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method achieves precise phase retrieval by eliminating the influence of high-order diffraction beams, enhancing the detection accuracy of wavefront aberration in optical imaging systems with a large measurable range and adjustable shear ratio.

Implementation Method 1

there are multistage high-order diffraction beams and interference can occur between the high-order diffraction beams in the interference field of the shearing interferometer due to the diffraction of the grating at the object plane

Methodology Applied
Scientific EffectDiffraction: Diffraction

Implementation Method 2

interference can occur between the high-order diffraction beams in the interference field of the shearing interferometer

Methodology Applied
Scientific EffectInterference: Interference

Data Source

PatentUS10969274B2Method for detecting wavefront aberration for optical imaging system based on grating shearing interferometer
Publication Date: 2021.04.06 SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
  • US10969274B2 patent drawing
  • US10969274B2 patent drawing
  • US10969274B2 patent drawing

AI summary

Method for detecting wavefront aberration for optical imaging system based on grating shearing interferometer, the grating shearing interferometer system comprising a light source and illumination system, an optical imaging system to be tested, a one-dimensional diffraction grating plate, a two-dimensional diffraction grating plate, a two-dimensional photoelectric sensor, and a computing unit. The one-dimensional and two-dimensional diffraction grating plates are respectively placed on the object plane and the image plane of the optical imaging system to be tested. By collecting interferograms with phase-shifting amounts of 0, π/2, π, 3π/2 and N sets of α, π-α, 2π-α (where,N=2⁢(fix⁡(ceil⁡(1⁢/⁢s)2)+1),s is the shear ratio of the grating shearing interferometer system), combined with a certain phase retrieval algorithm, the influence of all high-order diffraction beams on the phase retrieval accuracy is eliminated, and finally the detection accuracy of wavefront aberration for the imaging system to be tested is improved.