Grooved Pellicle Frame for Lithography Mask Pressure Balance
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Solution Overview
Problem
Existing mask pellicle systems in photolithography processes face issues with pressure differential balancing, leading to membrane distortion, wrinkling, or breakage, which can render the system unusable, due to inadequate protection against particles and pressure differences.
Innovation Solution
A pellicle frame with strategically designed grooves on its surface is used to secure a thin membrane, preventing particle contamination and maintaining pressure balance, thereby enhancing the durability and functionality of the mask pellicle system.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a thin membrane is used to protect the mask from particles, then particle protection is improved, but the membrane becomes susceptible to distortion, wrinkling, or breakage due to pressure differential
Solution Approach 1:
The pellicle frame incorporates grooves at specific locations to create localized pressure equalization zones. These grooves are strategically positioned to allow pressure differential balancing at critical points while maintaining overall membrane protection, thus preventing distortion and breakage without compromising particle protection.
Solution Approach 2:
The grooves in the pellicle frame act as intermediary structures that mediate between the internal and external pressure environments. By providing controlled pathways for pressure equalization, the grooves protect the membrane from excessive pressure differential while maintaining the protective enclosure against particles.
2Object-affected harmful factors
If the pellicle frame is made completely sealed to protect against particles, then particle protection is improved, but pressure differential cannot be balanced, leading to membrane failure
Solution Approach 1:
The pellicle frame incorporates grooves at specific locations to create localized pressure equalization zones. These grooves are strategically positioned to allow pressure differential balancing at critical points while maintaining overall membrane protection, thus preventing distortion and breakage without compromising particle protection.
Solution Approach 2:
The grooves in the pellicle frame create a controlled porous structure that allows pressure equalization while maintaining particle protection. The groove geometry is designed to permit gas or vapor passage for pressure balancing while being sufficiently small or configured to trap particles, thus resolving the contradiction between sealing and pressure equalization.
3Reliability
If grooves are added to the pellicle frame for pressure balancing, then membrane integrity is improved, but device complexity increases
Solution Approach 1:
The pellicle frame is segmented into regions with and without grooves, allowing pressure equalization only at specific locations. This segmentation approach maintains membrane integrity through targeted pressure balancing while minimizing the overall structural complexity by limiting grooves to necessary areas rather than implementing a complex grooved pattern throughout.
Data Source
AI summary
Pellicle-mask systems for advanced lithography, such as extreme ultraviolet lithography, are disclosed herein. An exemplary pellicle-mask system includes a mask having an integrated circuit (IC) pattern, a pellicle membrane, and a pellicle frame. The pellicle frame has a first surface attached to the pellicle membrane and a second surface opposite the first surface attached to the mask, such that the IC pattern of the mask is positioned within an enclosed space defined by the mask, the pellicle membrane, and the pellicle frame. A void is defined between the pellicle frame and the mask, where the void is defined by a portion of the second surface of the pellicle membrane not attached to the mask. The void is not in communication with the enclosed space and is not in communication with an exterior space of the pellicle-mask system.