Grounding Assembly for Vacuum Processing Apparatus
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Solution Overview
Problem
Vacuum processing chambers face challenges in achieving uniform and reliable electrical contact when processing multiple substrates on carriers or susceptors, particularly due to non-conforming tray or susceptor configurations, leading to limited and discrete electrical paths.
Innovation Solution
The implementation of a plasma processing chamber with a pedestal and a combination of fixed posts and resilient contacts provides reliable and repeatable multi-point electrical contact, ensuring consistent grounding and alignment for substrates, even when using removable trays or susceptors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single grounding point is used for the carrier, then the structure is simple, but the electrical contact is unreliable and non-uniform
Solution Approach 1:
The single grounding point is segmented into multiple grounding points (first grounding point and second grounding point) distributed at different locations on the carrier. This segmentation provides multiple electrical contact paths, ensuring that even if one contact point fails, others maintain reliable grounding. The multiple contact points also distribute the electrical load and improve uniformity of electrical contact across the carrier surface.
2Reliability
If fixed posts alone are used for grounding, then the structure is simple, but the electrical contact is limited and discrete
Solution Approach 1:
The invention merges two different grounding mechanisms - fixed posts and resilient contacts - into a unified grounding system. The fixed posts provide stable structural support and consistent positioning, while the resilient contacts provide flexible electrical connection and compensation for manufacturing tolerances. This combination ensures both mechanical stability and reliable electrical contact, overcoming the limitations of using either mechanism alone.
3Adaptability or versatility
If non-conforming tray or susceptor configurations are used, then the adaptability is improved, but the electrical contact uniformity deteriorates
Solution Approach 1:
The resilient contacts are designed with elastic properties that allow them to deform and adapt to various carrier configurations. By changing the physical state of the contacts from rigid to elastic, the system can accommodate different tray or susceptor geometries while maintaining consistent electrical contact. The elastic deformation compensates for manufacturing tolerances and configuration variations, ensuring uniform electrical contact across diverse carrier types.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution ensures improved electrical contact and alignment, facilitating efficient plasma processing by distributing the electrical connection over multiple points, enhancing processing reliability and repeatability, especially when handling multiple substrates or non-conforming carriers.
Implementation Method 1
a plurality of resilient contacts (438) distributed over an area of the pedestal. The fixed posts provide physical support for the carrier, while the resilient contacts provide reliable and repeatable multi-point electrical contact to the carrier
Data Source
Figure 1A
Figure 1B
Figure 1C
AI summary
Vacuum processing chambers having provisions for improved electrical contact to substrate carrier. Specific embodiments provide a plasma processing chamber having a pedestal for supporting the carrier, and a plurality of fixed posts and resilient contacts are distributed over the area of the pedestal. The fixed posts provide physical support for the carrier, while the resilient contacts provide reliable and repeatable multi-point electrical contact to the carrier.