Grounding Ring Layout for Stable RF Plasma Electrode Gap Adjustment
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Solution Overview
Problem
The increasing complexity of semiconductor processing requires adjustable electrode plate gaps in plasma processing devices, which leads to instability in the radio frequency environment due to fluctuations in the radio frequency circuit.
Innovation Solution
A plasma processing device is designed with a movable grounding ring, a fixed grounding ring, a retractable sealing assembly, and a conductive connector that forms a radio frequency path between the movable and fixed grounding rings, reducing radio frequency coupling and maintaining stability even with varying electrode plate gaps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the lower electrode assembly moves up and down to adjust the electrode plate gap, then different etching steps can be completed, but the radio frequency circuit stability deteriorates
Solution Approach 1:
The grounding structure is segmented into a movable grounding ring and a fixed grounding ring, separated by the retractable sealing assembly. This segmentation allows the electrode assembly to move independently for gap adjustment while the grounding rings maintain stable radio frequency reference points, resolving the contradiction between adaptability and reliability.
Solution Approach 2:
The retractable sealing assembly acts as an intermediary between the movable and fixed grounding rings. It provides a stable radio frequency path while accommodating the movement of the electrode assembly, thereby maintaining circuit stability during gap adjustment without compromising either adaptability or reliability.
2Volume of moving object
If the retractable sealing assembly is positioned close to the fixed grounding ring, then space is saved, but horizontal-direction radio frequency coupling increases
Solution Approach 1:
The harmful radio frequency coupling effect is extracted and eliminated by positioning the retractable sealing assembly away from the vertical part of the fixed grounding ring. This spatial separation removes the source of interference while the conductive connector provides the necessary electrical connection without the harmful coupling.
Solution Approach 2:
The conductive connector is arranged on the side of the retractable sealing assembly away from the inner side wall, utilizing the radial dimension to establish the radio frequency path. This dimensional arrangement avoids horizontal-direction coupling while maintaining electrical connectivity.
3Reliability
If the conductive connector forms a radio frequency path between the movable and fixed grounding rings, then radio frequency stability is maintained, but the structure becomes more complex
Solution Approach 1:
The conductive connector serves multiple functions: it provides the radio frequency path between grounding rings, accommodates the movement of the retractable sealing assembly, and maintains electrical connectivity. This multi-functionality reduces the need for additional separate components, thereby managing complexity while ensuring reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively stabilizes the radio frequency circuit and maintains a consistent etching rate across different electrode plate gaps, thereby improving the yield and reliability of semiconductor wafer production.
Implementation Method 1
The conductive connector shares the radio frequency current bearing pressure of the retractable sealing assembly
Implementation Method 2
weakening horizontal-direction radio frequency coupling of the vertical part of the fixed grounding ring to the retractable sealing assembly
Implementation Method 3
radio frequency energy is input into the vacuum processing chamber so as to activate the reactive gas to ignite or maintain plasma
Data Source
AI summary
A plasma processing device includes: a vacuum processing chamber internally provided with a movable lower electrode assembly; a movable grounding ring arranged at a bottom of the movable lower electrode assembly; a fixed grounding ring arranged below the movable grounding ring; a retractable sealing assembly arranged between the movable grounding ring and the fixed grounding ring; a conductive connector used for forming a radio frequency path between the movable grounding ring and the fixed grounding ring, where a distance between an outer wall of the retractable sealing assembly and a central axis of the vacuum processing chamber is less than an outer diameter of the movable grounding ring; and a match with a radio frequency transmitting end and a radio frequency receiving end of a radio frequency circuit. The plasma processing device has the advantages that the device utilizes the conductive connector for sharing the radio frequency current bearing pressure of the retractable sealing assembly, and meanwhile, the retractable sealing assembly is far away from a vertical part of the fixed grounding ring, thereby weakening horizontal-direction radio frequency coupling of the fixed grounding ring to the retractable sealing assembly, and even when the retractable sealing assembly is stretched or compressed, the radio frequency circuit cannot be greatly influenced.