Guide Plate Cleaning via Inclined Grooves and Hydrophilic Patterns

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Solution Overview

Problem

Conventional substrate treatment apparatuses face challenges in effectively cleaning guide plates due to photoresist contamination and inefficient use of cleaning solutions, which leads to incomplete cleaning and excessive solution consumption.

Innovation Solution

An apparatus and method that incorporate a guide plate with an inclined outer part and grooves for collecting and reusing cleaning solutions, along with a controller to synchronize the supply of treatment and cleaning solutions, ensuring efficient cleaning of the guide plate during the substrate coating process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If cleaning solution is supplied to clean the guide plate, then cleaning effectiveness is improved, but cleaning solution consumption increases

Engineering Contradiction:
Improvecleaning effectivenessVSAvoidcleaning solution consumption
Core Design Contradiction:
ReliabilityVSLoss of substance

Solution Approach 1:

The guide plate is designed with different surface characteristics in different regions: a hydrophilic region that promotes cleaning solution flow and a hydrophobic region that prevents excessive solution adhesion. This local differentiation of surface properties enables effective cleaning while reducing overall cleaning solution consumption.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The guide plate structure itself facilitates the cleaning process by using its hydrophilic-hydrophobic pattern to automatically direct and control cleaning solution flow, reducing the need for external cleaning mechanisms and minimizing solution waste through self-regulating flow patterns.

Inventive Principle:
Principle #25Self-service

2Area of stationary object

If cleaning solution flows along the guide plate slope, then cleaning coverage is improved, but solution reuse becomes difficult

Engineering Contradiction:
Improvecleaning coverageVSAvoidsolution reuse ability
Core Design Contradiction:
Area of stationary objectVSLoss of substance

Solution Approach 1:

A collection tray or container is introduced as an intermediary element to capture the cleaning solution after it flows down the guide plate slope. This mediator enables both comprehensive cleaning coverage through slope-driven flow and solution reuse by collecting and recycling the spent cleaning solution.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Reliability

If cleaning is performed after photoresist coating, then guide plate contamination is removed, but cleaning difficulty increases due to photoresist solidification

Engineering Contradiction:
Improvecontamination removalVSAvoidcleaning difficulty
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

A hydrophilic layer is pre-formed on the guide plate surface before photoresist coating. This preliminary surface treatment creates a surface that resists photoresist adhesion, allowing for easier removal of contaminants during subsequent cleaning operations without requiring aggressive cleaning methods.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution reduces the amount of cleaning solution required and ensures thorough cleaning of the guide plate by utilizing centrifugal force to direct cleaning solutions to hard-to-reach areas, improving the efficiency of the cleaning process.

Implementation Method 1

utilizing centrifugal force to flow cleaning solution onto the guide plate

Methodology Applied
Scientific EffectCentrifugal force: Centrifugal Force

Data Source

PatentUS10534265B2Apparatus for treating substrate and method for cleaning guide plate
Publication Date: 2020.01.14 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US10534265B2 patent drawing
  • US10534265B2 patent drawing
  • US10534265B2 patent drawing

AI summary

The present disclosure relates to an apparatus for treating a substrate. The apparatus for treating a substrate includes a cup having an inner space whose top is open, a supporting unit for supporting a substrate in the inner space, a guide plate provided to surround the supporting unit, a treatment solution supplying unit for supplying a treatment solution to an upper surface of the substrate supported by the supporting unit, and a cleaning solution supplying unit for supplying a cleaning solution to an upper surface of the guide plate.