Guide Rail Cleaning Motion to Protect Carrying Platform Purity
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Solution Overview
Problem
In semiconductor manufacturing, dust or unexpected particles accumulating on the top surface of machine main bodies can fall onto carrying platforms due to airflow disturbances, contaminating them and affecting the quality and yield of processed parts.
Innovation Solution
A machine cleaning device with a guide rail, support, driving device, and controller is used to move a cleaning component along the guide rail away from the carrying platform, effectively preventing particles from falling onto it during the cleaning process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the carrying platform is exposed to the machine main body for easy access, then the ease of operation is improved, but dust or particles accumulated on the machine main body top surface can fall onto the carrying platform due to airflow disturbance, worsening the manufacturing precision
Solution Approach 1:
The cleaning device performs preliminary cleaning of the machine main body top surface before particles can fall onto the carrying platform. The cleaning component is positioned and activated in advance to remove accumulated dust and particles, preventing their subsequent fall onto the carrying platform during airflow disturbances.
Solution Approach 2:
The cleaning device acts as an intermediary between the machine main body and the carrying platform. By introducing this intermediate cleaning mechanism, particles are removed from the machine main body surface before they can contaminate the carrying platform, thus mediating the harmful interaction between airflow disturbance and particle contamination.
2Reliability
If air flows from top to bottom in the clean room to prevent dust flying, then the reliability of the clean room environment is improved, but particles on the machine main body top surface are disturbed and fall onto the carrying platform, worsening the manufacturing precision
Solution Approach 1:
The cleaning device converts the harmful effect of airflow disturbance (which causes particles to fall) into a beneficial cleaning action. The same airflow that was causing contamination is now utilized or supplemented by the cleaning mechanism to actively remove particles from the machine main body surface, transforming the harmful airflow effect into a useful cleaning function.
Data Source
AI summary
The present application provides a machine cleaning device. The machine cleaning device includes: a guide rail arranged next to a carrying platform of the machine main body, a support slidably mounted on the guide rail, a cleaning component mounted on the support, a driving device connected to the support in a transmission way, and a controller connected to the driving device; and when the cleaning component cleans the top surface of the machine main body, the controller controls the driving device to drive the support to move along the guide rail, so as to drive the cleaning component to clean the top surface of the machine main body in a direction away from the carrying platform. So that unexpected particles are reduced to fall on the carrying platform and contaminate the carrying platform during the cleaning process.