Guide Vane for Substrate Treating Apparatus Airflow Control
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Solution Overview
Problem
Conventional substrate treating apparatuses face challenges in maintaining a set pressure within the treating space due to rotational airflow stagnation, leading to inefficient exhaust and potential particle scattering during high-speed substrate rotation.
Innovation Solution
The apparatus incorporates a guide vane mounted on a stationary support frame to direct rotational airflow downward, ensuring smooth exhaust and preventing pressure buildup by guiding airflow towards the exhaust line, thus maintaining a stable internal pressure and preventing particle formation on the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the support unit rotates at high speed to perform liquid treatment on the substrate, then the cleaning efficiency is improved, but the rotational airflow becomes stronger causing pressure buildup and exhaust difficulty
Solution Approach 1:
A guide vane is introduced as an intermediary component between the rotating support unit and the exhaust line. The guide vane mediates the rotational airflow by redirecting it toward the exhaust line, preventing pressure buildup while maintaining high-speed rotation for effective cleaning
2Productivity
If the support unit rotates at high speed, then the liquid treatment performance is improved, but the rotational airflow causes airflow stagnation and prevents smooth exhaust
Solution Approach 1:
The guide vane serves as a mediator that captures the rotational airflow generated by high-speed support unit rotation and channels it toward the exhaust line, ensuring stable exhaust operation while maintaining effective liquid treatment performance
3Stress or pressure
If the inner pressure of the treating space increases above the set pressure, then the rotational airflow is stronger for better cleaning, but the exhaust line cannot effectively discharge the treating space
Solution Approach 1:
The guide vane acts as an intermediary that manages the relationship between pressure and exhaust effectiveness. It redirects the pressure-driven rotational airflow toward the exhaust line, ensuring that increased pressure translates to improved cleaning while maintaining effective exhaust discharge
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively alleviates airflow stagnation, maintains set pressure, and prevents particle formation on the substrate during high-speed rotation, ensuring efficient exhaust and minimizing the risk of liquid returning to the substrate.
Implementation Method 1
As the support unit 2630 rotates, a rotational airflow is generated within the treating space
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating container having a treating space; a support unit configured to support and rotate a substrate in the treating space; an exhaust line coupled to the treating container and configured to exhaust an airflow within the treating space; a support frame provided independently of a rotation of the support unit and positioned between the treating container and the support unit; and a guide vane protruding to an outside of the support frame and configured to guide the airflow within the treating space in a downward direction.