Substrate Rotation With Guided Non-Circular Orbits for Uniform Thin Films
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Solution Overview
Problem
Existing thin film deposition technologies face challenges in achieving uniform film thickness on large substrates due to non-uniform spatial distribution of film material, requiring complex mechanical structures that increase weight and reduce durability.
Innovation Solution
A substrate rotating apparatus with a main rotation mechanism, auxiliary rotation mechanism, and guide structure that allows for non-circular revolving orbits, such as elliptical orbits, to displace all points on the substrate uniformly with respect to the film material distribution, eliminating the need for precise film thickness correction plates and planetary gear mechanisms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a planetary gear mechanism is used to rotate and revolve the substrate, then the substrate can be rotated on its own axis while revolving, but the mechanical structure becomes complex and the device weight increases
Solution Approach 1:
The invention extracts and eliminates the planetary gear mechanism from the system, replacing it with a direct drive configuration where the substrate holder is simply rotated by a rotation unit without additional planetary gears. This removes the complex mechanical structure while maintaining the substrate rotation function needed for uniform film formation.
Solution Approach 2:
The invention replaces the mechanical planetary gear system with a simplified rotational mechanism controlled by a rotation unit. This substitution reduces mechanical complexity while achieving the same functional outcome of substrate rotation and revolution for uniform thin film deposition.
2Manufacturing precision
If a planetary gear mechanism is used to rotate and revolve the substrate, then the substrate can be rotated on its own axis while revolving, but the device weight increases and durability deteriorates
Solution Approach 1:
The invention removes the planetary gear mechanism that causes weight increase and durability issues, replacing it with a simpler rotation system. This extraction of the problematic component directly addresses the reliability and weight concerns while preserving the essential substrate rotation capability.
Solution Approach 2:
The invention substitutes the heavy and less durable planetary gear mechanism with a lighter, more reliable direct rotation system. This replacement improves device reliability and reduces weight while maintaining the functional requirement for substrate rotation during film deposition.
3Manufacturing precision
If a film thickness correction plate is used to make the film thickness uniform, then the film thickness can be made uniform, but the correction plate must be mounted with high precision and may need to be remade
Solution Approach 1:
Instead of using a correction plate to compensate for non-uniform material distribution, the invention inverts the approach by rotating the substrate itself during deposition. This dynamic approach actively distributes the film material uniformly across the substrate surface, eliminating the need for static correction plates and their associated mounting precision requirements.
Solution Approach 2:
The invention transitions from a static correction plate approach to a dynamic substrate rotation approach. By continuously rotating the substrate during film deposition, the system dynamically ensures uniform film thickness distribution, eliminating the need for precisely mounted correction plates that would require periodic remaking.
4Manufacturing precision
If a complex mechanical structure is employed for improved uniformity of the thin film, then the uniformity of the thin film can be improved, but the weight of the device may increase
Solution Approach 1:
The invention extracts and removes the complex mechanical structures that increase device weight, replacing them with a simplified rotation system. This extraction achieves thin film uniformity through substrate rotation alone, without the additional weight of complex mechanical components.
Solution Approach 2:
The invention replaces heavy complex mechanical structures with a lightweight substrate rotation mechanism. This substitution maintains the ability to produce uniform thin films while significantly reducing the moving weight of the device, improving both performance and efficiency.
Data Source
AI summary
A substrate rotating apparatus includes a main rotation mechanism, an auxiliary rotation mechanism, and a guide structure. The main rotation mechanism rotates around a first rotation shaft. The main rotation mechanism includes the auxiliary rotation mechanism. The auxiliary rotation mechanism revolves about the first rotation shaft, and rotates around a second rotation shaft. The second rotation shaft is displaced in a circumferential direction with respect to a third rotation shaft provided between the first rotation shaft and the second rotation shaft. The guide structure has a contact surface extending in a circumferential direction with respect to the first rotation shaft. The guide structure controls displacement of the second rotation shaft in the circumferential direction with respect to the third rotation shaft, and causes the auxiliary rotation mechanism to perform the revolving motion in an orbit along the contact surface.