Guiding Templates for Block Copolymer Self-Assembly
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Solution Overview
Problem
Current lithography techniques face challenges in achieving high-resolution patterning of nano-scale features due to limitations in feature size reduction, particularly in projection photolithography and imprint lithography, where the resolution is constrained by radiation wavelength and numerical aperture, and there is a need for more efficient methods to guide self-assembly of block copolymers for precise feature formation.
Innovation Solution
A method is developed to determine the characteristics of a guiding template for self-assembly of block copolymers, allowing for the formation of complex design layouts by combining guiding templates for individual features without exceeding maximum curvature limits based on numerical aperture and radiation wavelength, enabling precise control over height, shape, spacing, material, and surface chemistry to achieve high-resolution patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If guiding templates for individual features are combined to form complex design layouts, then the versatility and applicability of the self-assembly method increases, but the curvature constraints and manufacturing complexity increase
Solution Approach 1:
The patent divides complex design layouts into individual feature templates that can be independently designed and then combined. Each template is segmented to handle specific geometric features, and the overall complex pattern is assembled from these modular template units, reducing the complexity of designing entire complex layouts from scratch.
Solution Approach 2:
The patent combines multiple individual feature templates to form joined guiding templates for complex design layouts. By merging simpler templates that satisfy curvature constraints individually, the method creates versatile complex patterns while maintaining manufacturability through the curvature limitation.
2Reliability
If maximum curvature limits are imposed on guiding templates based on numerical aperture and wavelength, then the manufacturability and reliability of pattern transfer improve, but the design flexibility and resolution potential are constrained
Solution Approach 1:
The patent establishes maximum curvature limits as a critical parameter for guiding template design, derived from the numerical aperture and wavelength of the lithography system. By controlling the curvature parameter within these limits, the method ensures reliable pattern transfer while optimizing feature resolution and design flexibility within the manufacturable range.
3Manufacturing precision
If block copolymer self-assembly is used to achieve high-resolution patterning, then the feature size reduction capability improves, but the control over domain orientation and position becomes more difficult
Solution Approach 1:
The patent applies preliminary patterning to the substrate surface before block copolymer deposition to create guiding templates with specific geometric features. These pre-formed templates provide positional and orientational guidance that directs the self-assembly of block copolymer domains, ensuring they form at the desired locations with correct orientations while maintaining high resolution.
Solution Approach 2:
The patent introduces guiding templates as an intermediary structure between the lithography system and the block copolymer self-assembly process. These templates mediate the interaction by providing geometric constraints and chemical guidance that control domain formation, making the self-assembly process controllable while preserving its high-resolution capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the formation of high-resolution patterns with reduced computational costs and improved manufacturability, allowing for the precise alignment and placement of nano-scale features on substrates, enhancing the efficiency of lithography processes and reducing defects in self-assembled patterns.
Implementation Method 1
it may undergo an order-disorder transition on cooling below a certain temperature (order-disorder transition temperature To/d) resulting in phase separation of copolymer blocks
Implementation Method 2
a lithographic projection apparatus to transfer a pattern of the guiding template onto a substrate
Data Source
AI summary
A method of determining a characteristic of a guiding template for guiding self-assembly of block copolymer to form an entirety of a design layout, or a portion thereof, including a plurality of design features, each design feature including one or more elemental features, the method including selecting a characteristic of a guiding template for each of the one or more elemental features of the plurality of design features from a database or a computer readable non-transitory medium, the database or the computer readable non-transitory medium storing a characteristic of a guiding template for each of the one or more elemental features, and determining the characteristic of the guiding template to form the entirety of the design layout, or the portion thereof, by combining the selected characteristic of the guiding template for the one or more elemental features for each of the plurality of design features.