Conductive Hafnium Silicate Seed Layer for MTJ Memory

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Solution Overview

Problem

Current semiconductor memory devices face challenges in achieving low resistance, high tunneling magnetoresistance (TMR) characteristics, and retention characteristics due to incoherent tunneling effects and parasitic resistance, particularly in Magnetic Tunnel Junction (MTJ) structures with insulating seed layers.

Innovation Solution

Incorporating a conductive hafnium silicate seed layer with an oxygen content of 1% to 10% to improve the anisotropy energy of magnetic layers, reducing resistance and enhancing TMR and retention characteristics in MTJ structures.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If an insulating seed layer is used in MTJ structure, then the anisotropy energy of magnetic layers is improved, but the resistance increases and TMR characteristics deteriorate

Engineering Contradiction:
Improveanisotropy energyVSAvoidresistance and TMR characteristics
Core Design Contradiction:
StrengthVSReliability

Solution Approach 1:

The patent changes the physical and chemical parameters of the seed layer by controlling the oxygen content to be 1% to 10%, transforming it from an insulating state to a conductive state. This parameter change enables the seed layer to simultaneously provide adequate anisotropy energy and low resistance, resolving the contradiction between magnetic layer stability and electrical conductivity.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses a composite seed layer structure comprising hafnium silicate with controlled oxygen content, combining the benefits of insulating properties for magnetic anisotropy with conductive properties for low resistance. The composite material approach allows simultaneous achievement of both required functions that were previously mutually exclusive.

Inventive Principle:
Principle #40Composite materials

2Strength

If the oxygen content in hafnium silicate seed layer is increased, then the anisotropy energy improves, but the electrical conductivity decreases

Engineering Contradiction:
Improveanisotropy energyVSAvoidelectrical resistance
Core Design Contradiction:
StrengthVSLoss of energy

Solution Approach 1:

The patent precisely controls the oxygen content parameter within the optimal range of 1% to 10%, finding the balance point where both anisotropy energy and electrical conductivity are satisfied. This parameter optimization resolves the trade-off between magnetic performance and electrical performance by identifying the specific oxygen concentration range that achieves both goals simultaneously.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The use of conductive hafnium silicate seed layers improves the low resistance and TMR characteristics while maintaining low resistance and high TMR, thereby enhancing the switching and retention characteristics of semiconductor memory devices.

Implementation Method 1

the seed layer to improve the anisotropy energy of the first magnetic layer includes a conductive material having a metallic property and an oxygen content of 1% to approximately 10%

Methodology Applied
Scientific EffectAnisotropy energy: Anisotropy

Implementation Method 2

a tunnel barrier layer formed over the first magnetic layer, and a second magnetic layer formed over the tunnel barrier layer

Methodology Applied
Scientific EffectTunneling magnetoresistance: Magnetoresistance

Data Source

PatentUS10777742B2Electronic device and method for fabricating the same
Publication Date: 2020.09.15 SK HYNIX INC
  • US10777742B2 patent drawing
  • US10777742B2 patent drawing
  • US10777742B2 patent drawing

AI summary

Methods, systems, and devices are disclosed for implementing semiconductor memory using variable resistance elements for storing data. In one aspect, an electronic device is provided to comprise a semiconductor memory unit including: a substrate; an interlayer dielectric layer disposed over the substrate; and a variable resistance element including a seed layer formed over the interlayer dielectric layer, a first magnetic layer formed over the seed layer, a tunnel barrier layer formed over the first magnetic layer, and a second magnetic layer formed over the tunnel barrier layer, wherein the seed layer includes a conductive material having a metallic property and an oxygen content of 1% to approximately 10%.