Halftone Photomask for Display Panel Manufacturing

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Solution Overview

Problem

The high cost and time-consuming process of manufacturing photomasks in display panel production pose a significant technical challenge, as they are essential for both thin film transistor and photodiode manufacturing.

Innovation Solution

The use of a halftone photomask with multi-transmittance M reduces the number of photomasks required by dividing the photoresist layer into regions with varying transmittances, allowing for the formation of necessary structures without the need for multiple photomasks, thereby reducing processing costs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If multiple photomasks are used for manufacturing thin film transistor and photodiode, then manufacturing precision is improved, but processing cost and time increase

Engineering Contradiction:

Improvephotomask manufacturing precisionVSAvoidnumber of photomasks

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent merges the photodiode array photomask and the second photomask for display panel manufacturing into a single integrated photomask structure. This integration allows both the photodiode array formation and the display panel structure formation to be accomplished using one photomask, thereby reducing the total number of photomasks required while maintaining the necessary manufacturing precision for both components

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The integrated photomask design enables a single photomask to serve multiple functions: it defines both the photodiode array regions and the display panel structural elements (such as pixel electrodes and transistor regions). This multi-functionality reduces the need for separate specialized photomasks for each component type

Inventive Principle:

Principle #6Universality (Multi-functionality)

2Manufacturing precision

If multiple photomasks are used for manufacturing thin film transistor and photodiode, then manufacturing precision is improved, but processing time increases

Engineering Contradiction:

Improvephotomask manufacturing precisionVSAvoidphotomask processing time

Core Design Contradiction:

Manufacturing precisionVSLoss of time

Solution Approach 1:

By combining multiple photomask functions into a single integrated photomask, the patent eliminates the sequential processing steps required for multiple photomask applications. This merging reduces the total processing time while maintaining precision through the unified design that accounts for both photodiode array and display panel requirements in a single masking operation

Inventive Principle:

Principle #5Merging (Combining)

3Manufacturing precision

If multiple photomasks are used for manufacturing thin film transistor and photodiode, then manufacturing precision is improved, but processing cost increases

Engineering Contradiction:

Improvephotomask manufacturing precisionVSAvoidprocessing cost

Core Design Contradiction:

Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent combines multiple photomask functions into a single integrated photomask, directly reducing the number of photomasks that need to be manufactured, stored, and disposed of. This merging significantly reduces processing costs while maintaining manufacturing precision through the unified design approach that integrates both photodiode array and display panel patterning requirements

Inventive Principle:

Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively reduces the number of photomasks and processing costs while maintaining the precision required for display panel manufacturing, enhancing the efficiency of the production process.

Implementation Method 1

forming a groove located right above the gate electrode and a first through hole located above a middle region of the substrate on the photoresist layer through a halftone photomask with multi-transmittance M and dividing the photoresist layer into a first region on one side of the gate electrode and a second region on the other side of the gate electrode through the first through hole

Methodology Applied

Scientific EffectPhotomask with multi-transmittance: Absorption (EM radiation)

Data Source

PatentUS10840276B2Display panel and method for manufacturing the same

Publication Date: 2020.11.17 HKC CORP LTD

AI summary

The present application provides a display panel and a method for manufacturing the same. The method includes: forming a groove right above a gate electrode and a first through hole above a substrate on a photoresist layer by using a halftone photomask with multi-transmittance and dividing the photoresist layer into a first region and a second region through the first through hole.