Halide Adsorbing Liners for Titanium Film Deposition
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The deposition of titanium-containing films in integrated circuit manufacturing using titanium tetrachloride as a precursor results in significant chlorine and chloride contamination, affecting the performance of semiconductor devices and increasing maintenance costs due to chamber contamination.
Innovation Solution
Incorporating adsorptive materials with a higher affinity for chlorine and chlorides, such as carbon, silicon, manganese, or amines, into the reaction chamber, either as removable liners or coatings, to adsorb and remove chlorine and chloride byproducts during the deposition process, reducing contamination levels by one to two orders of magnitude.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If titanium tetrachloride is used as a precursor for depositing titanium-containing films, then the deposition process can proceed within the preferred temperature range, but significant chlorine and chloride contamination occurs in the films and reaction chamber
Solution Approach 1:
A removable liner composed of adsorptive material is introduced as an intermediary component between the titanium tetrachloride precursor and the substrate. The liner adsorbs chlorine and chloride byproducts during deposition, preventing them from contaminating the film and chamber while allowing the deposition to proceed at preferred temperatures
Solution Approach 2:
The harmful chlorine and chloride byproducts are converted into a beneficial situation by using adsorptive materials that selectively bind these contaminants. The contamination problem is transformed into an opportunity to demonstrate the effectiveness of adsorptive materials in selective contaminant removal
2Object-generated harmful factors
If adsorptive materials are incorporated into the reaction chamber to remove chlorine and chloride byproducts, then contamination levels are reduced, but the device complexity increases
Solution Approach 1:
The removable liner is designed as a disposable or easily replaceable component. After accumulating adsorbed contaminants, the liner can be removed and replaced without complex regeneration systems, simplifying the overall device architecture while maintaining effective contamination control
Solution Approach 2:
The adsorptive material is incorporated into a porous structure that provides high surface area for contaminant adsorption. The porous nature allows the material to effectively trap chlorine and chloride byproducts while maintaining a relatively simple liner geometry
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces chlorine-based contamination in titanium-containing films and reaction chambers, maintaining the integrity of semiconductor devices and reducing maintenance costs, while operating within the preferred temperature range for deposition processes.
Implementation Method 1
Incorporating adsorptive materials with a higher affinity for chlorine and chlorides, such as carbon, silicon, manganese, or amines, into the reaction chamber, either as removable liners or coatings, to adsorb and remove chlorine and chloride byproducts during the deposition process
Data Source
AI summary
A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the halide adsorbing material is also provided.