Halogenated Resin Composition for Lithography Sensitivity and CDU
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Solution Overview
Problem
Next-generation photolithography technologies require resist materials with enhanced sensitivity, critical dimension uniformity (CDU) performance, and resolution, which conventional materials struggle to achieve, especially with the use of short-wavelength radiation and advanced exposure techniques.
Innovation Solution
A radiation-sensitive resin composition incorporating a specific structural unit represented by formula (1), which includes a resin with an aromatic hydrocarbon group substituted with iodine or bromine atoms, combined with a radiation-sensitive acid generator and a solvent, to improve energy absorption efficiency and acid generation, thereby enhancing sensitivity and CDU performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If a styrene-based resin with enhanced radiation absorption efficiency is used, then sensitivity is improved, but critical dimension uniformity and resolution deteriorate
Solution Approach 1:
The patent employs a composite resin structure combining polystyrene backbone with grafted aromatic hydrocarbon groups containing iodine or bromine atoms. This composite approach allows the resin to simultaneously achieve high radiation absorption efficiency from the halogenated aromatic groups and maintain good solubility control for CDU performance through the polystyrene matrix and carboxy group introduction.
Solution Approach 2:
The invention introduces specific functional groups (carboxy groups) at localized positions within the resin molecule through the action of radiation-sensitive acid generators. This local modification enables differential solubility behavior in alkaline developers, allowing the resin to exhibit both high radiation sensitivity and controlled solubility for maintaining critical dimension uniformity.
2Use of energy by moving object
If the aromatic hydrocarbon group substituted with iodine or bromine atoms is introduced, then sensitivity is improved, but solubility in alkaline developer deteriorates
Solution Approach 1:
The patent modifies the chemical parameters of the resin by introducing carboxy groups through radiation-induced reactions. This parameter change (adding polar, ionizable groups) fundamentally alters the resin's interaction with alkaline developers, transforming it from poor solubility to controlled solubility while preserving the high energy absorption capability of the halogenated aromatic structure.
Solution Approach 2:
The radiation-sensitive acid generator acts as an intermediary that facilitates the transformation of the resin's solubility properties. Upon radiation exposure, it generates acid that catalyzes the formation of carboxy groups, thereby mediating between the radiation absorption function and the solubility requirement for development.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves improved sensitivity, CDU performance, and resolution, enabling the formation of high-quality resist patterns suitable for advanced semiconductor device fabrication.
Implementation Method 1
the energy absorption efficiency during exposure is improved, and the acid generation efficiency is enhanced
Implementation Method 2
generating an acid by irradiating the coating of the resist composition with a radioactive ray through a mask pattern, and then reacting in the presence of the acid as a catalyst
Data Source
AI summary
A radiation-sensitive resin composition includes a resin including a structural unit (I) represented by formula (1). Ra is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; Ar1 is a substituted or unsubstituted divalent aromatic hydrocarbon group having 6 to 20 carbon atoms; m is 0 or 1; L1 is a single bond, or —O—, *—COO—, a divalent hydrocarbon group having 1 to 20 carbon atoms, or a combination thereof, and * is a bond on an Ar1 side; Ar2 is a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms and substituted with X; X is an iodine atom or a bromine atom; and n1 is an integer of 1 to nmax, wherein nmax is the number of Xs when all hydrogen atoms in the monovalent aromatic hydrocarbon group represented by the Ar2 are substituted with X.