Hardmask Composition with Fluorene Units for Etch Resistance

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Solution Overview

Problem

The semiconductor industry faces challenges in forming hardmask layers with sufficient etch resistance and solubility, as increasing carbon content in hardmask compositions for improved etch resistance can hinder solubility, making it difficult to apply spin-coating techniques effectively.

Innovation Solution

A hardmask composition incorporating a polymer with structural units featuring aromatic hydrocarbon rings and fluorenes, which enhances carbon content and solubility, is developed, including a solvent to improve fluidity and etch resistance, thereby achieving excellent gap-fill and planarization characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If carbon content in hardmask composition is increased to improve etch resistance, then etch resistance is improved, but solubility deteriorates

Engineering Contradiction:

Improveetch resistanceVSAvoidsolubility

Core Design Contradiction:

StrengthVSReliability

Solution Approach 1:

The patent employs a composite polymer structure containing both aromatic hydrocarbon rings (for etch resistance) and fluorene units (for solubility). This composite molecular architecture allows the hardmask composition to simultaneously achieve high etch resistance through carbon-rich aromatic structures and adequate solubility through fluorene segments that interact favorably with solvents.

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The polymer structure incorporates different functional units with specialized roles: aromatic hydrocarbon ring units provide localized etch resistance, while fluorene units provide localized solubility. This spatial distribution of different chemical properties within the polymer chain resolves the contradiction between etch resistance and solubility.

Inventive Principle:

Principle #3Local quality

2Strength

If carbon content in hardmask composition is increased to improve etch resistance, then etch resistance is improved, but ease of manufacture deteriorates

Engineering Contradiction:

Improveetch resistanceVSAvoidspin-coating applicability

Core Design Contradiction:

StrengthVSEase of manufacture

Solution Approach 1:

The composite polymer with aromatic hydrocarbon rings and fluorenes provides both high etch resistance and good spin-coating processability. The fluorene units contribute to appropriate viscosity and fluidity for spin-coating, while the aromatic rings ensure etch resistance, eliminating the need for alternative manufacturing methods.

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The patent optimizes molecular weight and compositional ratios of the polymer to achieve optimal processing parameters. By controlling these parameters, the composition maintains appropriate viscosity and fluidity for spin-coating while preserving high carbon content for etch resistance.

Inventive Principle:

Principle #35Parameter changes

Data Source

PatentUS20230101786A1Hardmask composition, hardmask layer, and method of forming patterns

Publication Date: 2023.03.30 SAMSUNG SDI CO LTD

AI summary

Provided are a hardmask composition including a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a solvent, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, wherein the definitions of Chemical Formula 1 and Chemical Formula 2 are as described in the specification.