Header Circuit Integration in Metal Layers for IC Power Gating

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

As semiconductor integrated circuits (ICs) become smaller and more complex, reduced operating voltages affect IC performance and increase power consumption due to leakage currents, necessitating improved power management techniques.

Innovation Solution

The integration of a header circuit between metal layers in an IC, which includes a switch configured to provide different supply voltages to active and inactive circuits, reducing leakage current and power consumption by selectively turning off power to unused circuits.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If operating voltage is reduced to enable smaller and more complex ICs, then device size and complexity are improved, but power consumption increases due to leakage currents

Engineering Contradiction:
ImproveIC complexityVSAvoidpower consumption
Core Design Contradiction:
Device complexityVSLoss of energy

Solution Approach 1:

The IC is divided into multiple operational modes (active and inactive states) for different circuits. Power gating circuits selectively disconnect power supply to specific circuit blocks when they are not in use, segmenting the power distribution network to reduce leakage currents in inactive portions while maintaining full power to active portions.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent implements dynamic power management through power gating circuits that can switch between different power states based on circuit activity. The ability to dynamically turn off power to inactive circuits and restore it when needed allows the system to adapt power consumption to actual operational requirements, reducing overall energy loss.

Inventive Principle:
Principle #15Dynamics

2Loss of energy

If power gating is implemented to reduce power consumption, then power consumption and leakage currents are reduced, but device complexity increases

Engineering Contradiction:
Improvepower consumptionVSAvoidcircuit complexity
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The power gating circuits are designed to perform multiple functions: they act as switches for power control, provide leakage current blocking paths, and can be integrated with existing circuit blocks. This multi-functionality reduces the need for separate dedicated components, thereby limiting the increase in overall device complexity while achieving power reduction goals.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent introduces power gating circuits as intermediary elements between the power supply and various circuit blocks. These intermediary components selectively control power flow without requiring fundamental changes to the core circuit architecture, thus reducing power consumption while adding minimal complexity through standardized interface circuits.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Loss of energy

If header circuit is integrated between metal layers, then power consumption is reduced through selective power gating, but manufacturing complexity increases

Engineering Contradiction:
Improvepower consumptionVSAvoidmanufacturing complexity
Core Design Contradiction:
Loss of energyVSEase of manufacture

Solution Approach 1:

The power gating circuits are nested within the existing multi-layer metal structure of the IC. By integrating the power gating functionality into the existing metal layers and utilizing the existing fabrication process steps, the patent avoids adding significant manufacturing complexity while achieving the power reduction benefits of selective power gating.

Inventive Principle:
Principle #7Nested doll (Nesting)

Solution Approach 2:

The patent merges the power gating circuit functionality with the existing metal interconnect structure. The header circuits are combined with the metal layers during the same fabrication process, eliminating the need for separate manufacturing steps and reducing overall manufacturing complexity despite the added power management functionality.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS12380265B2Integrated circuit and method of forming the same
Publication Date: 2025.08.05 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12380265B2 patent drawing
  • US12380265B2 patent drawing
  • US12380265B2 patent drawing

AI summary

A method of forming an integrated circuit includes forming at least a first or a second set of devices in a substrate, forming an interconnect structure over the first or second set of devices, and depositing a set of conductive structures on the interconnect structure. The first and second set of devices are configured to operate on a first supply voltage. Forming the interconnect structure includes depositing a set of insulating layers over the first or second set of devices, etching the set of insulating layers thereby forming a set of trenches, depositing a conductive material within the set of trenches, thereby forming a set of metal layers, and forming a portion of a header circuit between a first and a second metal layer. The header circuit is configured to provide the first supply voltage to the first set of devices.