Heater Block Continuous Concavity for Plasma Substrate Positioning
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Solution Overview
Problem
The existing heater blocks in plasma deposition and etching apparatuses with uniform concave patterns hinder accurate automatic recognition of substrate location, leading to difficulties in substrate transfer and film uniformity.
Innovation Solution
A heater block design featuring a unique concave pattern with distinct center concaves and connecting channels, allowing for improved gas flow and substrate positioning, which aids in automatic substrate recognition and prevents non-uniform film formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a uniform pattern of concaves is provided on the heater block surface, then substrate support and foreign matter prevention are improved, but automatic recognition of substrate location becomes difficult
Solution Approach 1:
The patent applies asymmetry by providing a center concave with a different shape or size from the other concaves, and arranging support pins asymmetrically around the center. This creates a unique geometric feature at the center that serves as a reference point for automatic recognition sensors, enabling accurate substrate location detection while maintaining the uniform concave pattern for substrate support and foreign matter prevention
2Reliability
If multiple through-holes are provided for substrate support pins, then substrate positioning stability is improved, but gas flow uniformity deteriorates
Solution Approach 1:
The patent applies local quality by differentiating the center region from the surrounding regions. The center concave with distinct shape/size and the arrangement of support pins create localized structural variations that guide gas flow uniformly across the substrate surface, while still providing multiple through-holes for stable substrate positioning. This local differentiation ensures both positioning stability and film thickness uniformity
Data Source
AI summary
A heater block adapted to be installed in a plasma deposition or plasma etching apparatus that includes a showerhead and a reaction chamber, the heater block being adapted to be arranged in the reaction chamber to support a substrate and includes: at least one through-hole passing through the heater block, and on its upper face a plurality of surfaces separated from each other and defined by a continuous concavity; and the continuous concavity including: a plurality of main concaves or depressions, a plurality of concave channels connecting substantially every two adjacent main concaves or depressions, and a concave or depression, at the center of the heater block, of a different shape or size from the plurality of main concaves or depressions.