Substrate Heater Power Line Coil to Block RF Coupling
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Solution Overview
Problem
The existing substrate treating apparatuses face issues with reduced etching rates due to high-frequency power coupling between the RF power supply and the heater power supply, leading to inefficiencies and potential malfunctions.
Innovation Solution
A substrate treating apparatus is designed with a coupling blocking structure that includes a conductive line with a coil shape wound around a dielectric, installed on the power line between the RF power supply and the heater, to block high-frequency power coupling, thereby preventing the flow of RF power into the heater power supply.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If the heater and heater line are connected to each other, then the heater can be heated properly, but the etching rate for the substrate becomes lower
Solution Approach 1:
The coupling blocking structure is introduced as an intermediary component between the heater line and heater. This structure selectively blocks high-frequency power coupling while allowing low-frequency or direct current power to pass through, thereby maintaining heater temperature control without reducing the substrate etching rate
Solution Approach 2:
The coupling blocking structure changes the electrical parameters of the power transmission path by introducing frequency-selective impedance. It presents high impedance to high-frequency signals (blocking RF power coupling) while maintaining low impedance for low-frequency or DC power (allowing heater power transmission), thus resolving the contradiction between heating efficiency and etching rate
2Reliability
If the heater line is connected to the heater, then the heater can function, but high-frequency power from the RF power supply couples to the heater power supply causing potential malfunctions
Solution Approach 1:
The coupling blocking structure converts the harmful high-frequency power coupling into a beneficial frequency-selective filtering function. By designing the structure with specific inductance and capacitance values, it allows the same physical connection to serve dual purposes: transmitting heater power while blocking RF interference, thus protecting the heater power supply from malfunctions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances the etching rate by preventing power loss and reducing the risk of heater power supply failures, while allowing efficient AC or DC power transmission to the heater, thus improving treatment efficiency and reliability.
Implementation Method 1
a coupling blocking structure that is installed on a power line connected to the second power supply and the second component and blocks coupling of high-frequency power generated by the first power supply to the second power supply
Data Source
AI summary
A substrate treating apparatus includes a chamber having a treatment space, a first power supply that is connected to a first component provided in the treatment space and transmits power having a first frequency to the first component, a second power supply that is provided in the treatment space, is connected to a second component different from the first component, and transmits power having a second frequency smaller than the first frequency to the second component, and a coupling blocking structure installed on a power line connected to the second power supply and the second component, wherein the coupling blocking structure is electrically connected to the power line and includes a conductive line having a coil shape.