Heating Pixel Control for Localized Grating Etch Depth

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Solution Overview

Problem

Manufacturing waveguides on substrates for augmented reality is challenging due to uncontrolled temperature across the substrate, leading to inconsistent depth profiles of gratings, which affects the overlay of virtual images on the ambient environment.

Innovation Solution

A method involving individually controlling heating pixels and light emitting diodes (LEDs) to provide temperature distributions on a substrate, allowing for precise temperature control across different regions, enabling the formation of gratings with varying depths when exposed to an ion beam, thereby achieving localized heating and consistent grating profiles.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If uniform heating is applied across the substrate, then overall temperature control is achieved, but localized temperature variations needed for different grating depths cannot be obtained

Engineering Contradiction:
Improveoverall temperature controlVSAvoidgrating depth consistency
Core Design Contradiction:
TemperatureVSManufacturing precision

Solution Approach 1:

The substrate support assembly is divided into multiple independently controllable heating zones or heating elements, allowing different regions of the substrate to be heated to different temperatures. This segmentation enables precise localized temperature control for forming gratings with varying depths across different portions of the substrate.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the substrate are subjected to different temperature conditions tailored to the specific requirements of each grating region. This local quality approach ensures that each portion of the grating receives the optimal temperature for its intended depth profile, achieving consistent and controlled grating depths across the entire substrate.

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If temperature is increased to improve etch depth control, then grating formation is enhanced, but temperature uniformity across the substrate deteriorates

Engineering Contradiction:
Improveetch depth controlVSAvoidtemperature uniformity
Core Design Contradiction:
Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The heating system transitions from a static uniform temperature approach to a dynamic localized heating approach. Each heating zone can independently adjust its temperature in real-time based on the specific requirements of the grating region being processed, enabling precise etch depth control while maintaining overall thermal stability through active local regulation.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for precise control of etch depth and temperature across the substrate, resulting in consistent and controlled grating profiles, enhancing the overlay of virtual images in augmented reality experiences by ensuring accurate material properties across the substrate.

Implementation Method 1

individually controlling a plurality of heating pixels disposed in a dielectric body of a substrate support assembly, the plurality of heating pixels providing temperature distributions on a first surface of the substrate

Methodology Applied
Scientific EffectLocalized heating: Heating

Implementation Method 2

the plurality of heating pixels providing temperature distributions on a first surface of the substrate disposed on a support surface of the dielectric body

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Implementation Method 3

exposing the substrate to the ion beam to form a plurality of fins on the at least one grating

Methodology Applied
Scientific EffectIon beam etching: Ion Beam

Implementation Method 4

exposing the substrate to the ion beam to form a plurality of fins on the at least one grating, the at least one grating having a distribution of depths corresponding to the temperature distributions

Methodology Applied
Scientific EffectAblation: Ablation

Data Source

PatentUS11554445B2Methods for controlling etch depth by localized heating
Publication Date: 2023.01.17 APPLIED MATERIALS INC
  • US11554445B2 patent drawing
  • US11554445B2 patent drawing
  • US11554445B2 patent drawing

AI summary

Embodiments of the present disclosure relate to methods for controlling etch depth by providing localized heating across a substrate. The method for controlling temperatures across the substrate can include individually controlling a plurality of heating pixels disposed in a dielectric body of a substrate support assembly. The plurality of heating pixels provide temperature distributions on a first surface of the substrate disposed on a support surface of the dielectric body. The temperature distributions correspond to a plurality of portions of at least one grating on a second surface of the substrate to be exposed to an ion beam. Additionally, the temperatures can be controlled by individually controlling light emitting diodes (LEDs) of LED arrays. The substrate is exposed to the ion beam to form a plurality of fins on the at least one grating. The at least one grating has a distribution of depths corresponding to the temperature distributions.