Alignment Marks With Height Difference For Narrow Bezel Splicing

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Solution Overview

Problem

Conventional splicing screen technologies face challenges in achieving a narrow bezel width, leading to wide splicing gaps due to the inability to accurately distinguish and position alignment marks with overlapping exclusive areas, which affects the display quality of large-framed screens.

Innovation Solution

The use of alignment marks with a height difference on the substrate, allowing for precise positioning by adjusting the focal length of an image observation apparatus to distinguish between marks, thereby avoiding interference and enabling accurate alignment and splicing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Length of stationary object

If the bezel width of each display screen is narrowed to reduce splicing gap, then the splicing gap between screens is reduced, but alignment marks with overlapping exclusive areas cannot be distinguished and positioned accurately

Engineering Contradiction:
Improvesplicing gap widthVSAvoidalignment mark positioning accuracy
Core Design Contradiction:
Length of stationary objectVSMeasurement precision

Solution Approach 1:

The patent introduces a new dimension (height/depth) to the alignment marks by creating different focal lengths for marks with overlapping exclusive areas. This allows the image observation apparatus to distinguish between marks that are horizontally overlapped by focusing at different depths, thereby maintaining positioning accuracy while enabling narrower splicing gaps.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent changes the focal length parameter of the image observation apparatus to distinguish between alignment marks with overlapping exclusive areas. By adjusting the focal length to match specific mark heights, the system can selectively observe and position individual marks without interference from overlapped marks, solving the positioning accuracy problem.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If process allowance is reduced to minimum to narrow bezel width, then manufacturing precision is improved, but alignment marks still cannot be distinguished when exclusive areas overlap

Engineering Contradiction:
Improvebezel width precisionVSAvoidalignment mark distinction difficulty
Core Design Contradiction:
Manufacturing precisionVSDifficulty of detecting and measuring

Solution Approach 1:

The patent adds the height dimension to alignment marks, creating a vertical separation that allows distinction between marks with horizontally overlapped exclusive areas. This enables the image observation apparatus to focus at different depths to observe different marks, making detection and measurement possible even when marks are closely positioned.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent modifies the focal length parameter of the observation system to correspond with the height differences of alignment marks. By tuning the focal length to specific values, the system can selectively bring different marks into focus, thereby enabling clear detection and measurement of each mark despite overlapping exclusive areas.

Inventive Principle:
Principle #35Parameter changes

3Length of stationary object

If multiple alignment marks are positioned closely to reduce bezel width, then splicing gap is narrowed, but exclusive areas of alignment marks overlap causing positioning errors

Engineering Contradiction:
Improvebezel widthVSAvoidalignment positioning reliability
Core Design Contradiction:
Length of stationary objectVSReliability

Solution Approach 1:

The patent introduces height variation as a new dimension for alignment marks, allowing multiple marks to be positioned closely in the horizontal plane while remaining distinguishable through focal length adjustment. This maintains high positioning reliability by enabling selective observation of each mark despite their close proximity and overlapping exclusive areas.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent uses focal length as a discriminating parameter to reliably identify and position individual alignment marks. By assigning different focal lengths to marks with overlapping exclusive areas, the system ensures accurate and reliable positioning even when marks are densely arranged to minimize bezel width.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS9916121B2Substrate, display screen, splicing screen and alignment method of splicing screen
Publication Date: 2018.03.13 BOE TECHNOLOGY GROUP CO LTD
  • US9916121B2 patent drawing
  • US9916121B2 patent drawing
  • US9916121B2 patent drawing

AI summary

A substrate provided with alignment marks, a display screen, a splicing screen and an alignment method of splicing screen, in which, the splicing screen includes at least two display screens with alignment marks. A substrate of the display screen is provided with at least two alignment marks, and different alignment marks have a height difference therebetween which is larger or equal to a standard difference value. A narrow bezel splicing of display screens can be achieved by setting the alignment marks with different heights.