Hemispherical Gas Supply Nozzle for Uniform ALD Processing
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Solution Overview
Problem
Existing gas supply devices for semiconductor manufacturing, such as gas shower heads, face challenges in efficiently purging process gases due to large diffusion spaces and complex manufacturing processes, leading to increased costs and reduced yield in ALD processes.
Innovation Solution
A gas supply device with a top plate having a concave portion that extends toward the substrate, featuring a small-sized gas supply nozzle with multiple holes along its circumference, which reduces the diffusion space and manufacturing complexity, allowing for faster gas supply and purge processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If a gas shower head with a large diffusion space is used to supply process gas uniformly to multiple gas supply holes, then the gas distribution uniformity is improved, but the purge process time increases and productivity decreases
Solution Approach 1:
The patent transitions from a planar gas supply plate to a three-dimensional hollow hemisphere structure with gas supply holes formed on its surface. This dimensional change creates a compact diffusion space that maintains uniform gas distribution while significantly reducing the volume requiring purging, thereby improving productivity without sacrificing gas supply uniformity
2Adaptability or versatility
If a gas shower head with multiple stacked plates is used to form gas flow paths, then the gas supply function is improved, but the device complexity and manufacturing difficulty increase
Solution Approach 1:
The patent merges multiple functional components (gas supply plate, diffusion chamber, and flow path structure) into a single integrated hollow hemisphere body. The gas supply holes are directly formed on the hemisphere surface, eliminating the need for separate stacked plates and complex internal flow path structures, thus simplifying the device while maintaining gas supply functionality
Solution Approach 2:
The hollow hemisphere body incorporates numerous gas supply holes directly formed on its surface, creating a porous-like gas distribution pattern. This approach simplifies the structure by eliminating complex internal flow paths while maintaining effective gas supply to multiple locations simultaneously
3Quantity of substance
If a gas shower head with a large diffusion space is used, then the process gas can reach all gas supply holes, but the manufacturing cost increases due to precise stacking requirements
Solution Approach 1:
The hollow hemisphere body features gas supply holes directly formed on its surface in a porous-like arrangement, enabling comprehensive process gas coverage across all holes without requiring complex internal flow paths. This simplifies manufacturing by eliminating precise stacking requirements while maintaining effective gas distribution to all supply points
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces the time and cost associated with gas supply and purge processes, improving yield and manufacturing efficiency by minimizing the diffusion space and simplifying the device's structure, while ensuring uniform gas distribution across the substrate.
Implementation Method 1
a diffusion space is formed in the gas flow path for diffusing the gas in a horizontal direction
Data Source
AI summary
A gas supply device disposed opposite to a substrate mounted on a loading board in a processing container and supplying a process gas for processing the substrate comprises a top plate member having a recess formed to spread gradually toward the state in order to constitute a gas diffusion space at a position facing the substrate on the loading board, and a gas supply nozzle projecting into the recess from the top thereof and having a plurality of gas supply holes along the circumferential direction of the recess.