HEMT Drain Electrode Segmentation for Off-Current Reduction

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Solution Overview

Problem

Conventional high-electron mobility transistors (HEMTs) suffer from increased off-current (IOFF) and reduced breakdown voltage due to spiking defects caused by the reaction between metal drain electrodes and semiconductor layers, leading to electric field crowding and unnecessary current leakage.

Innovation Solution

A high-electron mobility transistor design featuring a substrate with a group III-V channel layer, barrier layer, and cap layer, where the first drain electrode forms a Schottky contact and the second drain electrode forms an ohmic contact, both laterally separated with an interlayer dielectric in between, optimizing electric field distribution without increasing contact area.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If an ohmic contact is formed between the drain electrode and the underlying semiconductor layer, then the contact resistance is kept low, but spiking defects are formed at the bottom of the drain electrode due to the reaction between the metal and semiconductor

Engineering Contradiction:
Improvecontact resistanceVSAvoidspiking defects
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The drain electrode is divided into two separate electrodes: a first drain electrode forming a Schottky contact and a second drain electrode forming an ohmic contact. This segmentation allows each electrode to perform its specific function independently - the Schottky contact provides high electric field distribution while the ohmic contact provides low contact resistance, eliminating the spiking defects that would occur with a single ohmic contact electrode.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the drain contact structure are given different contact types tailored to their specific functional requirements. The first drain electrode region uses Schottky contact properties for optimal electric field distribution, while the second drain electrode region uses ohmic contact properties for minimal resistance, optimizing each local area for its specific purpose.

Inventive Principle:
Principle #3Local quality

2Stress or pressure

If spiking defects are formed at the bottom of the drain electrode, then the electric field near the spiking defects becomes relatively high (E-field crowding), but this causes unnecessary current leakage and increases the IOFF of the HEMT

Engineering Contradiction:
Improveelectric field distributionVSAvoidoff-current
Core Design Contradiction:
Stress or pressureVSReliability

Solution Approach 1:

By segmenting the drain contact into two separate electrodes with different contact types, the electric field distribution is optimized without creating spiking defects. The Schottky contact first drain electrode provides controlled electric field distribution away from the semiconductor interface, preventing E-field crowding and the associated current leakage that would increase IOFF.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design reduces off-current (IOFF) and maintains low on-state resistance (RON), enhancing the reliability and performance of high-voltage semiconductor devices by improving electric field distribution and avoiding spiking defects.

Implementation Method 1

there is a Schottky contact between the first drain electrode and the underlying semiconductor layer

Methodology Applied
Scientific EffectSchottky contact: Conduction (electrical)

Implementation Method 2

there is an ohmic contact between the second drain electrode and the underlying semiconductor layer

Methodology Applied
Scientific EffectOhmic contact: Conduction (electrical)

Data Source

PatentUS11201234B1High electron mobility transistor
Publication Date: 2021.12.14 VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
  • US11201234B1 patent drawing
  • US11201234B1 patent drawing
  • US11201234B1 patent drawing

AI summary

A high-electron mobility transistor (HEMT) includes a substrate, a group III-V channel layer, a group III-V barrier layer, a group III-V cap layer, a source electrode, a first drain electrode, a second drain electrode, and a connecting portion. The group III-V channel layer, the group III-V barrier layer, and the group III-V cap layer are sequentially disposed on the substrate. The source electrode is disposed at one side of the group III-V cap layer, and the first and second drain electrodes are disposed at another side of the group III-V cap layer. The bottom surface of the first drain electrode is separated from the bottom surface of the second drain electrode, and the composition of the first drain electrode is different from the composition of the second drain electrode. The connecting portion is electrically coupled to the first drain electrode and the second drain electrode.