3D Heterogeneous Memory Stacking for Density Without Finer Scaling

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The existing planar memory cell technology faces challenges in scaling due to limitations in feature size, leading to a ceiling in memory density and increased manufacturing costs.

Innovation Solution

A 3D memory device architecture is proposed, which stacks heterogeneous memories such as NAND, DRAM, and SRAM, using face-to-face bonding with hybrid bonding interfaces to reduce interlayer electrical connections and enhance manufacturing efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If planar memory cells are scaled to smaller sizes by improving process technology, then memory density is improved, but manufacturing cost increases and feature size approaches lower limit

Engineering Contradiction:
Improvememory densityVSAvoidmanufacturing cost
Core Design Contradiction:
Quantity of substanceVSEase of manufacture

Solution Approach 1:

The patent transitions from planar (2D) memory cell architecture to three-dimensional stacked architecture. Multiple memory dies of different types (NAND, DRAM, SRAM) are vertically stacked and bonded together, utilizing the third dimension to increase memory density without further reducing feature sizes in the planar direction. This dimensional transition allows continued scaling of memory capacity while maintaining manufacturable feature sizes.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Quantity of substance

If planar memory cells are scaled to smaller sizes, then memory density is improved, but process and fabrication techniques become challenging

Engineering Contradiction:
Improvememory densityVSAvoidfabrication challenge
Core Design Contradiction:
Quantity of substanceVSManufacturing precision

Solution Approach 1:

The patent divides the memory system into multiple separate memory dies (NAND die, DRAM die, SRAM die) that are fabricated independently using their respective optimized processes. Each die type can be manufactured with its own specialized fabrication techniques without interfering with others. These segmented dies are then bonded together through wafer-level or chip-level packaging, transferring the integration challenge from fabrication to assembly where precision requirements are more manageable.

Inventive Principle:
Principle #1Segmentation

3Quantity of substance

If heterogeneous memory types are integrated in 3D stack, then memory density and data transfer rate are improved, but device complexity increases

Engineering Contradiction:
Improvememory densityVSAvoidintegration complexity
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent creates a universal 3D stacked memory architecture that can accommodate multiple memory types (NAND, DRAM, SRAM) with different characteristics and use cases. The bonding interface and interconnect structure are designed to be type-agnostic, allowing different memory dies to be stacked in various configurations depending on performance requirements. This multi-functional platform reduces integration complexity by providing a standardized approach that works across different memory technologies.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentEP3891786B1Stacked three-dimensional heterogeneous memory devices and methods for forming same
Publication Date: 2025.01.22 YANGTZE MEMORY TECH CO LTD
  • EP3891786B1 patent drawingFigure 1
  • EP3891786B1 patent drawingFigure 2
  • EP3891786B1 patent drawingFigure 3

AI summary

Embodiments of three-dimensional (3D) memory devices and fabrication methods thereof are disclosed. In an example, a 3D memory device includes NAND memory cells and a first bonding layer including first bonding contacts. The 3D memory device also includes a second semiconductor structure including DRAM cells and a second bonding layer including second bonding contacts. The 3D memory device also includes a third semiconductor structure including SRAM cells, a third bonding layer including third bonding contacts, and a fourth bonding layer including fourth bonding contacts. The third and fourth bonding layers are on both sides of the SRAM cells. The semiconductor device further includes a first bonding interface between the first and third bonding layers. The first bonding contacts are in contact with the third bonding contacts at the first bonding interface. The 3D memory device further includes a second bonding interface between the second and fourth bonding layers. The second bonding contacts are in contact with the fourth bonding contacts at the second bonding interface.