Hierarchical Circuit Layout Automation for DFM Compliance

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Solution Overview

Problem

Existing methods for improving integrated circuit layouts for manufacturability are tedious and costly, as they require manual analysis and modification of each cell in the layout hierarchy, often leading to design rule violations and inefficiencies in ensuring compliance across all levels of the hierarchy.

Innovation Solution

A method that traverses a tree-type hierarchical layout representation of the circuit design, identifying improvement opportunities and applying modifications to cells while ensuring that these changes satisfy design and manufacturability rules across all blocks of the same type, thereby preserving the layout hierarchy and avoiding rule violations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If manual analysis and modification of each cell in the layout hierarchy is performed, then design compliance with DFM requirements can be achieved, but the process becomes tedious, time-consuming, and costly

Engineering Contradiction:
Improvedesign complianceVSAvoidanalysis time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent segments the layout hierarchy into multiple levels (top-level design, blocks, cells) and processes each level systematically. The computer-implemented method traverses the hierarchy level by level, applying DFM rules at each segment independently while maintaining overall compliance, thereby automating what would otherwise require tedious manual analysis of every cell.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent performs preliminary analysis of the entire layout hierarchy before finalizing modifications. The method first identifies all potential DFM violations across the hierarchy, then systematically applies corrections in a predetermined sequence from top-level blocks down to individual cells, ensuring compliance is achieved efficiently before manufacturing.

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If modifications are made to cells at one level in the layout hierarchy to improve DFM compliance, then manufacturing margin may be improved, but design rule violations may be created at other levels

Engineering Contradiction:
Improvemanufacturing marginVSAvoiddesign rule compliance
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent implements a feedback mechanism where modifications at one level of the hierarchy are automatically checked against design rules at all other levels. The computer-implemented method traverses the entire hierarchy to verify that proposed cell modifications improve DFM compliance without creating violations elsewhere, providing feedback loops that ensure overall design integrity is maintained.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent merges the analysis of multiple hierarchy levels into a unified automated process. Instead of treating each cell independently, the method combines DFM analysis across blocks, cells, and interconnections, evaluating modifications in the context of the entire hierarchy to ensure that improving manufacturing margin at one level does not compromise design rules at other levels.

Inventive Principle:
Principle #5Merging (Combining)

3Manufacturing precision

If bottom-up analysis of each cell is performed to determine DFM compliance, then manufacturing improvements can be identified, but the complexity of analyzing many cells at multiple levels increases

Engineering Contradiction:
ImproveDFM complianceVSAvoidanalysis complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent segments the complex analysis task into manageable hierarchical levels. Rather than analyzing all cells simultaneously, the method divides the layout into top-level blocks, intermediate blocks, and individual cells, processing each segment systematically. This segmentation reduces analysis complexity while maintaining comprehensive DFM coverage across all levels.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS7793238B1Method and apparatus for improving a circuit layout using a hierarchical layout description
Publication Date: 2010.09.07 XILINX INC
  • US7793238B1 patent drawing
  • US7793238B1 patent drawing
  • US7793238B1 patent drawing

AI summary

Various approaches for improving an integrated circuit layout. In one approach, a tree-type hierarchical layout representation of the circuit design is traversed. At each block visited during the traversing, a process determines whether there exists an improvement opportunity for each cell associated with the block. In response to determining that an improvement opportunity exists for a cell of a first block of the plurality of blocks, the process determines whether a modification to the cell satisfies one or more rules for every other block of the block type of the first block in the hierarchical representation. If the rules are satisfied, the modification is stored. Otherwise, the modification is discarded.