High Angle Ion Beam Extraction Plate for 3D Etching

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Solution Overview

Problem

Existing ion beam processing technologies face challenges in controlling ion beams at high angles of incidence, particularly for treating 3D structures, as they require precise control over ion beam orientation and distribution to effectively etch vertical surfaces while minimizing horizontal surface etching.

Innovation Solution

The development of an extraction plate with a concave central portion and a patterned electrode, separated by insulating gaps, which generates ion beams at high angles (>65 degrees) by modifying the electric field and ion trajectory, allowing for precise control of ion beam incidence and distribution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If perpendicular incidence ion beam processing is used, then the ion beam can be easily controlled and processed, but it cannot effectively etch vertical surfaces or achieve high angle etching required for 3D structures

Engineering Contradiction:

Improveetching precision for vertical surfacesVSAvoidcontrol difficulty of ion beam

Core Design Contradiction:

Manufacturing precisionVSEase of operation

Solution Approach 1:

The extraction plate incorporates a concave surface geometry that focuses ions onto the substrate at high angles. The curved extraction surface modifies the electric field distribution to achieve high angle ion extraction, enabling effective etching of vertical surfaces while maintaining process control

Inventive Principle:

Principle #14Spheroidality (Curvature)

Solution Approach 2:

The invention transitions from conventional perpendicular (0-degree) ion beam incidence to high angle (65-85 degrees) incidence by changing the extraction geometry. This dimensional change in beam orientation enables access to vertical surfaces and complex 3D structures that were previously inaccessible

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

2Manufacturing precision

If high angle ion beam extraction is implemented, then etching of vertical surfaces and 3D structures is enabled, but the system complexity increases due to specialized extraction optics

Engineering Contradiction:

Improveability to etch 3D structuresVSAvoidextraction plate structure

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The extraction plate combines multiple functions into a single component: it serves as both the plasma chamber boundary and the ion extraction optics. The concave extraction surface is integrated directly into the extraction plate structure, eliminating the need for separate focusing elements and simplifying the overall system

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The extraction plate performs multiple roles simultaneously: it defines the plasma chamber boundary, generates the extraction electric field, and focuses ions onto the substrate. This multi-functional design reduces the number of components needed while achieving high angle ion beam extraction

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Manufacturing precision

If conventional extraction plates are used, then the system design is simple, but ion beam distribution cannot be optimized for selective etching of vertical versus horizontal surfaces

Engineering Contradiction:

Improveselective etching controlVSAvoidextraction plate fabrication

Core Design Contradiction:

Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The extraction plate features a localized concave extraction surface with specific geometric parameters (radius of curvature, depth) that are optimized for high angle ion extraction. This localized geometric modification creates the desired non-uniform electric field and ion angular distribution without requiring complex modifications to the entire plate structure

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables efficient etching of 3D structures by increasing ion dose on vertical surfaces and reducing it on horizontal surfaces, thereby enhancing processing precision and throughput while maintaining a compact ion beam system design.

Implementation Method 1

an extraction aperture arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side... generates ion beams at high angles (>65 degrees) by modifying the electric field and ion trajectory

Methodology Applied

Scientific EffectElectric field: Electric Field

Implementation Method 2

a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body... generates ion beams at high angles (>65 degrees) by modifying the electric field and ion trajectory

Methodology Applied

Scientific EffectElectric field: Electric Field

Data Source

PatentUS11361935B2Apparatus and system including high angle extraction optics

Publication Date: 2022.06.14 APPLIED MATERIALS INC

AI summary

An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.