High-Current Electron Beam Surface Processing Apparatus
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Solution Overview
Problem
Conventional surface processing apparatuses using electron beams for semiconductor manufacturing have low current values, limiting processing speed and throughput.
Innovation Solution
A surface processing apparatus that irradiates inspection objects with electron beams of higher current values (10 nA to 100 A) using multiple electron sources, lens systems, and photoelectric cathodes, along with optical microscopes for precise positioning, enabling high-speed processing and enhanced throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional electron beam exposure devices are used with small current values (approximately 1 nA or less), then the electron beam can be generated with conventional electron sources, but the processing speed is slow and throughput is low
Solution Approach 1:
The patent combines multiple electron sources (first and second electron sources) to generate multiple electron beams simultaneously, merging their currents to achieve high total current (10 nA to 100 µA) while maintaining the ability to perform surface processing at high speed and high throughput
2Productivity
If multiple electron sources are used to generate high current electron beams (10 nA to 100 µA), then processing speed and throughput are enhanced, but the device complexity increases
Solution Approach 1:
The patent designs a multi-functional apparatus that can perform both observation functions (using the optical microscope) and surface processing functions (using high-current electron beams) within a single integrated system, reducing the need for separate equipment and simplifying the overall workflow despite using multiple electron sources
3Speed
If high current electron beams (10 nA to 100 µA) are used for surface processing, then high-speed processing is achieved, but precise positioning and control become more difficult
Solution Approach 1:
The patent uses an optical microscope to observe and determine the position to be processed before irradiating with the electron beam, performing preliminary positioning at lower magnification and then switching to electron beam mode for high-speed processing, ensuring accurate positioning before high-current irradiation begins
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves high-speed surface processing and significantly enhances throughput by using high-current electron beams across larger areas, improving processing efficiency compared to conventional methods.
Implementation Method 1
a light source which generates light having a predetermined wavelength; a photoelectric cathode which generates the electron beam by being irradiated with the light emitted from the light source
Data Source
AI summary
A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.