High-K Exhaust Collector With Dual-Temperature Oxide Capture
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Solution Overview
Problem
Current collection apparatuses struggle to efficiently collect High K materials like Al2O3, HfO2, and ZrO2 from exhaust gases in semiconductor manufacturing, leading to potential clogging and contamination issues due to the difficulty in managing high-temperature exhausts and solidifying by-products.
Innovation Solution
The apparatus employs a box-shaped collection system with a low-temperature region created by a cooling pad, featuring multiple coolant storage pads and obstruction plates to circulate coolant, guiding exhaust gases through a multi-stage collection plate system with varying hole sizes and shapes, and a mesh filter discharge port to minimize direct outflow and enhance collection efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If exhaust gas is heated to high temperature to prevent solidification of by-products, then clogging of inlet port is prevented, but efficient collection of High K material becomes difficult
Solution Approach 1:
The collection apparatus is divided into multiple temperature zones: a high-temperature region (heater) for preventing solidification and clogging, and a low-temperature region (cooling pad) for efficient High K material collection. This spatial segmentation allows each zone to optimize its temperature for its specific function.
Solution Approach 2:
Different regions of the collection apparatus are assigned different thermal properties: the inlet region maintains high temperature to prevent solidification, while the collection region maintains low temperature to enhance High K material deposition efficiency. This local quality differentiation resolves the contradiction between preventing clogging and enabling efficient collection.
2Productivity
If exhaust gas is cooled to low temperature to enhance oxidation reaction and High K material deposition, then collection efficiency improves, but solidification of by-products occurs causing clogging
Solution Approach 1:
The apparatus segments the exhaust gas treatment into distinct thermal zones: upstream high-temperature heating prevents solidification and clogging, while downstream low-temperature cooling enables efficient oxidation and High K material deposition. This segmentation allows both contradictory requirements to be satisfied in different spatial locations.
Solution Approach 2:
The exhaust gas is preliminarily heated in the high-temperature region before entering the low-temperature collection region. This preliminary heating action prevents solidification and clogging in advance, allowing the subsequent cooling phase to focus solely on enhancing High K material deposition without risking inlet port blockage.
3Device complexity
If general collection apparatus is used without heating, then structure is simpler, but solid-phase High K material cannot be efficiently collected
Solution Approach 1:
The apparatus controls temperature parameters dynamically: heating in the high-temperature region prevents solidification, then cooling in the low-temperature region promotes oxidation and High K material deposition. This parameter change strategy enables efficient High K material collection while maintaining relative structural simplicity through the use of standard heating and cooling components.
4Reliability
If heater is used to raise exhaust gas temperature, then clogging is prevented, but energy consumption increases
Solution Approach 1:
The heating function is segmented to only the high-temperature region near the inlet, while the collection region uses cooling. This spatial segmentation minimizes the volume of gas requiring continuous heating, thereby reducing overall energy consumption while still preventing clogging effectively.
Solution Approach 2:
Heating is applied preliminarily to prevent solidification and clogging before the gas enters the collection zone. This preliminary heating action uses energy only when necessary to prevent problems, rather than continuously heating the entire exhaust stream, thereby optimizing energy efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively collects and accumulates powdered oxides by inducing an oxidation reaction, preventing clogging and ensuring efficient removal of High K materials, thereby improving the durability and efficiency of the collection process.
Implementation Method 1
heating the exhaust gas with a heater part, and collect reaction by-products while dispersing exhaust gas, which contains a High K material that is thermally decomposed by the heater part
Implementation Method 2
grow a solid-phase High K material to the powdered oxide through the oxidation reaction in the low-temperature region
Implementation Method 3
the low-temperature region formed by the cooling pad part... accumulate the collected powdered oxides
Data Source
AI summary
The present disclosure relates to an apparatus for collecting reaction by-products for semiconductor processes through pyrolysis in a high-temperature region and an oxidation reaction in a low-temperature region, and an object of the present disclosure is to provide an apparatus for collecting reaction by-products, which is capable of collecting powdered oxides grown from High K materials by inducing an oxidation reaction in a box-shaped collection part having a low-temperature region formed by a cooling pad part after thermally decomposing the High K material at a high temperature of a heater in an inlet port of the collection apparatus when High K deposition precursors, which are supplied to a process chamber for an oxidation process for depositing a semiconductor dielectric film with the High K material having high permittivity in order to miniaturize a semiconductor circuit, are discharged together with exhaust gas.