Photonic Waveguide Structure Using High-k Material for Gap-Tolerant Coupling

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The integration of multi-layer waveguides in silicon photonic devices is hindered by the difficulty in controlling the nano-scale gap between them, leading to decreased coupling efficiency and increased insertion loss.

Innovation Solution

Incorporating high-dielectric constant materials between waveguide layers to increase gap tolerance and reduce the need for precise nano-scale gap control, thereby enhancing coupling efficiency and reducing insertion loss.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multi-layer waveguides are integrated on a wafer for light transfer, then light transfer capability is improved, but coupling efficiency decreases due to difficulty in controlling nano-scale gap

Engineering Contradiction:
Improvelight transfer capabilityVSAvoidcoupling efficiency
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent introduces an intermediary material layer between the waveguide layers to mediate the optical coupling. This intermediate layer facilitates light transfer between layers while eliminating the need for precise nano-scale gap control, thus resolving the contradiction between integrated light transfer capability and coupling efficiency

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent changes the structural parameters of the waveguide system by introducing an additional material layer with specific optical properties. This parameter change allows for relaxed gap tolerances while maintaining effective optical coupling between layers

Inventive Principle:
Principle #35Parameter changes

2Reliability

If nano-scale gap control is implemented between waveguide layers, then coupling efficiency is improved, but manufacturing difficulty increases

Engineering Contradiction:
Improvecoupling efficiencyVSAvoidmanufacturing difficulty
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

By introducing an intermediary material layer, the patent eliminates the need for precise nano-scale gap control during manufacturing. The intermediary layer absorbs dimensional variations and maintains effective optical coupling, significantly reducing manufacturing difficulty while preserving coupling efficiency

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent segments the gap region into a structured intermediate layer with defined optical properties, rather than relying on precise control of the void space. This segmentation approach simplifies manufacturing by providing a tangible material structure that can be deposited using standard fabrication processes

Inventive Principle:
Principle #1Segmentation

3Reliability

If precise nano-scale gap control is used between waveguide layers, then coupling efficiency is improved, but insertion loss increases

Engineering Contradiction:
Improvecoupling efficiencyVSAvoidinsertion loss
Core Design Contradiction:
ReliabilityVSLoss of energy

Solution Approach 1:

The intermediary material layer acts as an optical mediator that reduces insertion loss by providing a controlled refractive index transition between waveguide layers. This eliminates energy loss associated with uncontrolled gap variations while maintaining coupling efficiency

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The use of high-dielectric constant materials improves coupling efficiency and reduces transfer length between waveguide layers, minimizing the need for precise nano-scale gap control during manufacturing.

Implementation Method 1

a high-dielectric constant material is disposed between the first waveguide layer and the second waveguide layer

Methodology Applied
Scientific EffectDielectric constant: Dielectric Permittivity

Data Source

PatentUS12474532B2Photonic structure and method for manufacturing the same
Publication Date: 2025.11.18 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12474532B2 patent drawing
  • US12474532B2 patent drawing
  • US12474532B2 patent drawing

AI summary

A photonic structure and a method for manufacturing the same are provided. The photonic structure includes a substrate, an insulating structure, a first waveguide layer, a second waveguide layer and a high-dielectric constant material. The insulating structure is located over the substrate. The first waveguide layer is embedded in the insulating structure. The second waveguide layer is embedded in the insulating structure and longitudinally spaced apart from the first waveguide layer. The high-dielectric constant material is disposed between the first waveguide layer and the second waveguide layer.