High Temperature Memristor Using 2D Covalent Crystal Dielectric

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Solution Overview

Problem

Existing memristors lack stability at high temperatures, limiting their application in extreme environments, as their resistance values change due to ion migration and valence state changes, restricting their use above 200°C in industries like spaceflight and petroleum drilling.

Innovation Solution

A high temperature resistant memristor is developed using a two-dimensional covalent crystal material, such as transition metal chalcogenides or black phosphorus, doped with oxygen or sulfur, with a structure comprising a bottom electrode, a dielectric layer, and a top electrode, prepared using methods like chemical vapor deposition, maintaining stability up to 500°C.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If existing oxide material memristor structure is used, then device can be manufactured with current processes, but device fails at high temperature due to ion migration and valence state changes

Engineering Contradiction:
Improvehigh temperature stabilityVSAvoidmaterial stability at high temperature
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent changes the fundamental material parameter from oxide-based dielectric to two-dimensional covalent crystal material. This parameter change enables the memristor to maintain structural stability at high temperatures (≥500°C) where traditional oxide materials undergo ion migration and valence state changes, thereby resolving the contradiction between manufacturability and high temperature reliability.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs a composite structure combining two-dimensional covalent crystal material with electrode layers. The two-dimensional covalent crystal material serves as the core dielectric layer with exceptional thermal stability, while the electrodes provide electrical functionality. This composite approach maintains device manufacturability while achieving high temperature stability.

Inventive Principle:
Principle #40Composite materials

2Reliability

If two-dimensional covalent crystal material is used as dielectric, then high temperature stability is achieved, but manufacturing process complexity increases

Engineering Contradiction:
Improvehigh temperature resistanceVSAvoidfabrication process simplicity
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent transitions from three-dimensional oxide materials to two-dimensional covalent crystal materials. This dimensional change enables the material to be transferred onto existing electrode structures using flexible transfer techniques, thereby maintaining compatibility with current manufacturing processes while achieving superior high temperature stability.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent introduces a transfer mechanism as an intermediary process that bridges the two-dimensional covalent crystal material and the electrode structure. This intermediary approach allows the material to be manufactured separately under controlled conditions and then precisely positioned onto the device, simplifying the overall manufacturing process while maintaining high temperature performance.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The memristor exhibits excellent electrical switching properties, maintaining high and low resistance states for extended periods and supporting 1000 switching cycles, with a switching speed of less than 10^-7 seconds and state maintaining time over 105 seconds at 340°C, surpassing previous temperature limits.

Implementation Method 1

two-dimensional covalent crystal material that can keep the original crystal structure at a temperature of higher than or equal to 500° C.

Methodology Applied
Scientific EffectCovalent bonding: Chemical Bonding

Implementation Method 2

The dielectric is prepared by adopting a method of chemical vapor deposition (CVD)

Methodology Applied
Scientific EffectChemical vapor deposition: Chemical Vapour Deposition

Data Source

PatentUS10418550B2High temperature resistant memristor based on two-dimensional covalent crystal and preparation method thereof
Publication Date: 2019.09.17 NANJING UNIV
  • US10418550B2 patent drawing
  • US10418550B2 patent drawing
  • US10418550B2 patent drawing

AI summary

A high temperature resistant memristor comprises a bottom electrode, a dielectric and a top electrode, wherein the dielectric is a two-dimensional covalent crystal material or a two-dimensional covalent crystal material doped with oxygen or sulfur which has (1) the two-dimensional covalent crystal material or the two-dimensional covalent crystal material doped with oxygen or sulfur is adopted as the dielectric; (2) a memristor prepared by utilizing relatively high thermal stability of a lattice structure of two-dimensional transition metal; and (3) the high temperature resistant memristor.