High-Transparency Electrode Geometry for Ion Beam Uniformity
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Solution Overview
Problem
Conventional ion implantation systems experience undesirable beam shape issues, known as 'beam wiggles,' which degrade the uniformity and quality of the ion beam due to mechanical imperfections and high background pressure at the extraction electrodes, leading to poor ion beam quality.
Innovation Solution
The implementation of high-transparency electrodes with optimized geometric configurations, such as a double-slot or single-slot ground electrode with reduced base height and increased slot height, and protruded or tapered designs to enhance gas conductance and reduce 'beam wiggles, thereby improving ion beam quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If conventional ground electrode with base height greater than slot height is used, then structural stability is maintained, but beam uniformity deteriorates due to beam wiggles
Solution Approach 1:
The patent changes the geometric parameters of the ground electrode by inverting the conventional design: slot height is made greater than base height (reversing the traditional b>a relationship). This parameter inversion reduces beam wiggles and improves beam uniformity while maintaining structural stability through the optimized geometric configuration.
2Productivity
If extraction current is increased to improve productivity, then ion beam intensity increases, but beam quality deteriorates due to amplified beam wiggles
Solution Approach 1:
The patent modifies the geometric parameters of the extraction electrode structure, specifically making slot height greater than base height and optimizing the base angle (20-40 degrees) and slot angle (60-80 degrees). These parameter changes reduce beam wiggles and allow higher extraction currents to be applied without degrading beam quality, thereby enabling improved productivity.
3Ease of operation
If mechanical imperfections and high background pressure are present at extraction electrodes, then ease of operation is maintained, but beam uniformity deteriorates due to amplified beam wiggles
Solution Approach 1:
The patent optimizes the geometric parameters of the ground electrode (slot height > base height, specific base and slot angles) to create a structure that is tolerant to mechanical imperfections and background pressure variations. This allows the system to maintain beam uniformity even under less ideal operational conditions, preserving ease of operation while improving beam quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The improved gas conductance and reduced 'beam wiggles result in greater ion beam uniformity, reliability, and predictability, enhancing the overall quality of the ion beam for semiconductor manufacturing processes.
Implementation Method 1
the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality
Implementation Method 2
the extraction electrodes 104 may extract ions from plasma in the ion source 102
Implementation Method 3
an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough
Data Source
AI summary
Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.