High-Viscosity Curable Composition for Imprint Patterning

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Solution Overview

Problem

The existing photoimprint method faces challenges with low-viscosity curable compositions, where the low-viscosity compounds volatilize during patterning, leading to increased viscosity of the substrate and poor patternability, requiring high pressure and resulting in deteriorated pattern quality.

Innovation Solution

A curable composition with a high content of polymerizable monomers having a viscosity of 7 mPa·s or more, combined with a photopolymerization initiator, is used, which remains low in volatility and maintains good patternability even with pressure-reducing or heating steps, ensuring effective mold charging and pattern formation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If low-viscosity curable composition is used, then mold charging is improved, but volatility increases causing viscosity increase and poor patternability

Engineering Contradiction:
Improvemold chargingVSAvoidvolatility of low-viscosity compounds
Core Design Contradiction:
Ease of operationVSLoss of substance

Solution Approach 1:

The patent changes the viscosity parameter of the curable composition by formulating it to be 7 mPa·s or more at 25°C, which reduces volatility while maintaining adequate mold charging capability. This parameter optimization resolves the contradiction between ease of operation and substance loss.

Inventive Principle:
Principle #35Parameter changes

2Ease of operation

If low-viscosity curable composition is used, then mold charging is improved, but pattern quality deteriorates due to increased pressing pressure requirement

Engineering Contradiction:
Improvemold chargingVSAvoidpattern quality
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The patent optimizes the viscosity parameter to 7 mPa·s or more, which balances mold charging ease with pattern quality by reducing the need for high pressing pressure. This parameter adjustment prevents the deterioration of pattern quality while maintaining adequate mold charging.

Inventive Principle:
Principle #35Parameter changes

3Loss of substance

If pressure-reducing or heating steps are applied, then volatility is reduced, but viscosity of substrate increases causing poor patternability

Engineering Contradiction:
Improvevolatility reductionVSAvoidpatternability
Core Design Contradiction:
Loss of substanceVSEase of operation

Solution Approach 1:

The patent performs preliminary formulation of the curable composition with viscosity of 7 mPa·s or more before applying pressure-reducing or heating steps. This preliminary action ensures that the composition maintains appropriate viscosity throughout the process, preventing poor patternability while still achieving volatility reduction.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The high-viscosity curable composition effectively reduces volatility, maintains low viscosity during film formation, and enhances pattern quality by ensuring sufficient component retention on the substrate, even under conditions involving pressure reduction or heating, thereby improving pattern fidelity and reducing the need for high pressing forces.

Implementation Method 1

a curable composition for imprints, comprising at least one polymerizable monomer (A) and a photopolymerization initiator (B)

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS8530540B2Curable composition for imprints, patterning method and pattern
Publication Date: 2013.09.10 FUJIFILM CORP
  • US8530540B2 patent drawing

AI summary

A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The curable composition for imprints has low volatility of the components even in a thin film coating on a substrate and is thus capable of forming a good pattern.