HiPIMS Tungsten Sulfide Film via Conductive Target Layer
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Solution Overview
Problem
The poor conductivity of the WS2 target makes it difficult to achieve stable glow discharge and deposit a WS2 film with high compactness and wear resistance using high power impulse magnetron sputtering (HiPIMS).
Innovation Solution
A metal conductive film is deposited on the surface of the WS2 target, and then partially removed using magnetic field sputtering to create a first WS2 target. This modified target is then used for HiPIMS to produce a WS2 solid lubricating film with enhanced compactness and wear resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If HiPIMS is used to deposit WS2 film directly, then high deposition energy and compact film structure can be achieved, but stable glow discharge cannot be obtained due to poor target conductivity
Solution Approach 1:
A metal conductive film is deposited on the WS2 target surface to serve as an intermediary layer that improves electrical conductivity and enables stable glow discharge during HiPIMS process, while the magnetic field sputtering selectively removes this conductive layer in the target sputtering area to expose the WS2 material for film deposition
2Reliability
If pure WS2 film is prepared by magnetron sputtering, then good lubricating performance can be achieved, but the film has loose structure and poor wear resistance
Solution Approach 1:
The patent changes the deposition energy parameter by using HiPIMS technology with high power impulse to increase the energy deposited into the film, resulting in higher compactness and improved wear resistance while maintaining the lubricating properties of WS2
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves stable glow discharge and deposits a WS2 film with high compactness and excellent wear resistance, significantly improving the lubricating performance and durability of the film.
Implementation Method 1
using magnetron sputtering technology to deposit the metal conductive film on the surface of the WS2 target
Implementation Method 2
using magnetic field sputtering to remove the metal conductive film in a target sputtering area on the surface of the WS2 target
Implementation Method 3
performing the HiPIMS on the first WS2 target to obtain the WS2 solid lubricating film
Implementation Method 4
high power impulse magnetron sputtering (HiPIMS)
Data Source
AI summary
A preparation method for a tungsten sulfide (WS2) solid lubricating film based on high power impulse magnetron sputtering (HiPIMS) is provided. The preparation method includes the following steps: step 1: depositing a metal conductive film on a surface of a WS2 target; step 2: using magnetic field sputtering to remove the metal conductive film in a target sputtering area on the surface of the WS2 target, thereby obtaining a first WS2 target; and step 3: performing the HiPIMS on the first WS2 target to obtain the WS2 solid lubricating film. The preparation method can achieve stable glow discharge of a WS2 target and use the high deposition energy of HiPIMS to prepare the WS2 solid lubricating film with high compactness and excellent wear resistance.