HMD Display Pixel Stack With Photolithography-Controlled Optical Films
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Solution Overview
Problem
Existing head-mounted displays (HMDs) face challenges in achieving high-resolution images due to thickness deviations in optical auxiliary films, leading to differences in light emission efficiency and color blurring on the display panel.
Innovation Solution
The display device employs a manufacturing method that forms optical auxiliary films through a photolithography process without chemical mechanical polishing (CMP), ensuring precise thickness control and reducing thickness deviations, thereby minimizing color blurring and enhancing light emission efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If optical auxiliary films are formed using conventional manufacturing methods, then the manufacturing process is simpler, but thickness deviations occur leading to color blurring and reduced light emission efficiency
Solution Approach 1:
The patent changes the manufacturing parameter from conventional deposition methods to photolithography process, which enables precise thickness control of optical auxiliary films. By using photolithography, the thickness can be accurately defined by the photoresist layer thickness and development conditions, achieving uniform thickness across different emission areas and preventing color blurring.
Solution Approach 2:
The patent applies preliminary action by forming the optical auxiliary films before the light-emitting layer is deposited. This sequence allows the underlying electrode structures to be fully established and planarized first, providing a stable foundation for the optical auxiliary films. The photolithography process is performed in advance to define precise thickness and pattern, ensuring subsequent layers can be formed with high precision.
2Reliability
If thickness deviations in optical auxiliary films are reduced, then color blurring is minimized and light emission efficiency is improved, but the manufacturing process becomes more complex
Solution Approach 1:
The patent transitions from conventional film formation methods to photolithography-based thickness control, fundamentally changing the manufacturing parameter approach. This enables precise thickness definition through photoresist layer thickness control, ensuring uniform optical properties across the display panel and eliminating color blurring while maintaining high light emission efficiency.
Solution Approach 2:
The patent replaces mechanical polishing or conventional deposition methods with a photolithography-based approach. Instead of relying on mechanical processes that introduce thickness variations, the invention uses photochemical processes where thickness is defined by the photoresist layer and development parameters, providing superior thickness uniformity and eliminating color blurring issues.
3Manufacturing precision
If photolithography process is used to form optical auxiliary films, then thickness control is precise, but the manufacturing process becomes more complex
Solution Approach 1:
The patent fundamentally changes the manufacturing parameter from conventional deposition thickness control to photolithography-based thickness definition. The thickness is precisely controlled by the photoresist layer thickness and development conditions, enabling uniform optical auxiliary films across the entire display panel area, which is critical for preventing color blurring in high-resolution displays.
Solution Approach 2:
The patent applies universality by using the photolithography process, which is a standard and well-established technique in semiconductor manufacturing. This multi-functional approach allows the same photolithography equipment and process knowledge to be used for forming multiple layers and patterns throughout the display device manufacturing, reducing the need for specialized equipment despite the increased precision requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables high-resolution images by reducing thickness deviations in optical auxiliary films, minimizing color blurring, and improving light emission efficiency in HMDs.
Implementation Method 1
forms optical auxiliary films through a photolithography process without chemical mechanical polishing (CMP)
Data Source
AI summary
A display device includes a first sub-pixel including a first emission area for emitting first light, a second sub-pixel including a second emission area for emitting second light, a third sub-pixel including a third emission area for emitting third light, a substrate, an insulating film above the substrate, connection electrodes above the insulating film, reflective electrodes respectively above the connection electrodes, optical auxiliary films respectively above the reflective electrodes, and first electrodes respectively above the optical auxiliary films, wherein a thickness of a first of the optical auxiliary films at the first emission area is less than a thickness of a second of the optical auxiliary films at the second emission area.