Holographic Waveguide Surface Planarization for Image Artifact Control

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Solution Overview

Problem

Existing methods for manufacturing holographic waveguides struggle to compensate for nonuniform surface topography, leading to image artifacts due to light path deviations caused by surface nonuniformities.

Innovation Solution

A method involving applying a forming material coating to the substrate surfaces, bringing it into contact with a forming element having a desired surface profile, curing it, and releasing it to achieve surface planarization, using UV curing radiation and potentially depositing release or hard coat layers to correct nonuniformities.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional manufacturing methods are used for holographic waveguides, then production cost and complexity are reduced, but surface nonuniformities cause image artifacts due to light path deviations

Engineering Contradiction:
Improvesurface flatnessVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies preliminary action by performing surface planarization through forming material coating and curing before the holographic grating is recorded in the waveguide substrate. This pre-treatment ensures that the substrate surface is sufficiently flat to prevent light path deviations and image artifacts during subsequent optical operations, thereby resolving the contradiction between achieving high surface precision and maintaining process simplicity

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent introduces a forming material coating as an intermediary substance between the substrate and the curing process. This forming material acts as a mediator that transfers the flat surface geometry of the forming element to the substrate surface, enabling precise surface planarization without requiring complex direct machining or polishing operations, thus improving surface flatness while keeping the process relatively simple

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If surface planarization processes are applied to waveguide substrates, then image quality improves by eliminating light path deviations, but manufacturing time and process steps increase

Engineering Contradiction:
Improveimage qualityVSAvoidmanufacturing cycle time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent utilizes phase transitions by employing UV curing radiation to rapidly transform the forming material coating from a liquid or paste state to a solidified state. This rapid phase transition enables quick surface planarization without requiring lengthy drying, curing, or cooling periods, thereby improving image quality through effective surface flatness control while minimizing the time lost in the manufacturing cycle

Inventive Principle:
Principle #36Phase transitions

Solution Approach 2:

The patent replaces traditional mechanical surface finishing methods (such as polishing or grinding) with a chemical-physical curing process. Instead of using mechanical tools to remove material and achieve flatness, the forming material is applied and then cured in place to conform to the desired surface geometry, significantly reducing manufacturing time while maintaining high surface quality and image reliability

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively planarizes waveguide substrates, achieving flatness specifications and mitigating undesirable surface characteristics, enabling low-cost, lightweight, and efficient manufacturing of holographic waveguides for applications like helmet visors and car windshields.

Implementation Method 1

curing the forming material coating includes applying UV curing radiation via a curing configuration selected from the group consisting of one or more UV sources distributed above the forming material coating

Methodology Applied
Scientific EffectUV curing: Photopolymerisation

Implementation Method 2

the forming surface of the forming element has a surface characteristic for compensating for shrinkage of the forming material coating

Methodology Applied
Scientific EffectShrinkage compensation:

Data Source

PatentUS12397477B2Methods for compensating for optical surface nonuniformity
Publication Date: 2025.08.26 DIGILENS INC
  • US12397477B2 patent drawing
  • US12397477B2 patent drawing
  • US12397477B2 patent drawing

AI summary

Systems and methods for compensating for nonuniform surface topography features in accordance with various embodiments of the invention are illustrated. One embodiment includes a method for manufacturing waveguide cells, the method including providing a waveguide including first and second substrates and a layer of optical recording material, and applying a surface forming process to at least one external surface of the first and second substrates. In another embodiment, applying the surface forming process includes applying a forming material coating to the at least one external surface, providing a forming element having a forming surface, bringing the forming element in physical contact with the forming material coating, curing the forming material coating while it is in contact with the forming element, and releasing the forming material coating from the forming element.