Hybrid Bonded Interconnect Bridging for Sub-10 µm Chiplet Links

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Solution Overview

Problem

Existing solutions for high-performance chiplet integration require connection pitches greater than 25 micrometers, limiting the bandwidth and efficiency of chiplet connections.

Innovation Solution

The use of a hybrid bond, comprising a copper bond and an oxide bond, for direct bonding of an interconnect die to chiplets, enabling finer pitch connections less than 10 micrometers, along with trans-silicon via connections and conductive pillars for improved power and signal transfer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If existing bridge or interconnecting die solutions are used to connect chiplets, then connections can be established between chiplets, but the connection pitch must be greater than 25 micrometers, limiting bandwidth and efficiency

Engineering Contradiction:
Improveconnection pitchVSAvoidbandwidth
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent changes the bonding parameters by using hybrid bonding at lower temperatures (e.g., 200-400°C) compared to traditional Cu-Cu bonding (e.g., 400-600°C), enabling finer pitch connections below 10 micrometers while maintaining bond reliability through controlled thermal and mechanical conditions

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs hybrid bonding that combines different bonding mechanisms (e.g., oxide-to-oxide bonding with copper diffusion bonding) to achieve both fine pitch capability and reliable electrical connection, overcoming the limitations of single-mode bonding approaches

Inventive Principle:
Principle #40Composite materials

2Productivity

If connection pitch is reduced below 25 micrometers to increase bandwidth, then communication bandwidth improves, but existing bonding techniques cannot achieve such fine pitches with reliable connections

Engineering Contradiction:
Improvecommunication bandwidthVSAvoidconnection reliability
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent modifies bonding parameters including temperature, pressure, and bonding sequence to enable reliable connections at sub-10 micrometer pitches, where traditional bonding would fail due to alignment tolerances and material deformation

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent performs preliminary surface preparation including oxide formation and planarization before bonding to ensure proper alignment and contact at fine pitches, preventing connection failures before the bonding process occurs

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances signal quality, power efficiency, and overall performance by allowing for increased communication bandwidth through finer pitch connections between chiplets.

Implementation Method 1

The use of a hybrid bond, comprising a copper bond and an oxide bond, for direct bonding of an interconnect die to chiplets

Methodology Applied
Scientific EffectMetallurgical bonding: Welding

Data Source

PatentUS20250022847A1Hybrid bonded interconnect bridging
Publication Date: 2025.01.16 ADVANCED MICRO DEVICES INC
  • US20250022847A1 patent drawing
  • US20250022847A1 patent drawing
  • US20250022847A1 patent drawing

AI summary

A chip for hybrid bonded interconnect bridging for chiplet integration, the chip comprising: a first chiplet; a second chiplet; an interconnecting die coupled to the first chiplet and the second chiplet through a hybrid bond.