Hybrid Drop Pattern Generation for Nanoimprint Lithography

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Solution Overview

Problem

Current nanoimprint lithography techniques face challenges in generating optimal drop patterns for nano-fabrication, particularly in achieving uniform residual and top layer thicknesses across large substrate areas, which affects the precision and efficiency of pattern formation in nano-fabrication processes.

Innovation Solution

A method involving a two-step drop-pattern-generation process, where a region is divided into subregions, with an initial drop pattern generated using a first process and then refined using a second process based on the material map and initial pattern, to optimize drop patterns and improve pattern uniformity across the substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a single-step drop pattern generation process is used, then the process is simpler and faster, but the uniformity of residual and top layer thicknesses deteriorates

Engineering Contradiction:

Improveuniformity of residual and top layer thicknessesVSAvoidcomplexity of drop pattern generation process

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The drop pattern generation process is segmented into multiple sequential steps: an initial drop pattern generation step followed by a revision step. This segmentation allows each step to focus on specific aspects of pattern optimization, with the initial step establishing baseline patterns and the revision step refining uniformity, thereby achieving better manufacturing precision without requiring an overly complex single-step process.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The initial drop pattern generation process performs preliminary actions by creating an initial drop pattern based on material maps before the revision step. This preliminary pattern serves as a foundation that incorporates basic pattern formation rules, allowing subsequent revision steps to focus specifically on optimizing uniformity without starting from scratch, thus balancing process complexity with precision.

Inventive Principle:

Principle #10Preliminary action

2Manufacturing precision

If a two-step drop pattern generation process is used, then the uniformity of residual and top layer thicknesses is improved, but the generation time increases

Engineering Contradiction:

Improveuniformity of residual and top layer thicknessesVSAvoiddrop pattern generation time

Core Design Contradiction:

Manufacturing precisionVSLoss of time

Solution Approach 1:

By segmenting the pattern generation into two distinct steps, the computational workload is distributed more efficiently. The initial step handles bulk pattern formation quickly using material map data, while the revision step focuses only on local optimizations needed for uniformity. This segmentation prevents the time-consuming task of optimizing entire patterns from scratch in a single step.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The initial drop pattern generation performs preliminary computations that establish the baseline pattern structure before revision. This preliminary action reduces the computational burden of the second step, as it only needs to refine and optimize the initial pattern rather than generate and optimize everything from scratch, thereby reducing total generation time while maintaining precision.

Inventive Principle:

Principle #10Preliminary action

3Manufacturing precision

If drop patterns are generated without considering material maps, then the process is faster, but the precision of pattern formation deteriorates

Engineering Contradiction:

Improveprecision of pattern formationVSAvoidthroughput of nano-fabrication process

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The initial drop pattern generation step performs preliminary pattern creation based on material maps, establishing patterns that are already optimized for the specific material distribution. This preliminary action incorporating material map data avoids the need for time-consuming iterative adjustments later, as the initial patterns are already aligned with material requirements, thus maintaining both precision and productivity.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The process utilizes material map data to change and adjust drop pattern parameters such as drop position, size, and distribution. By incorporating material map information into the pattern generation parameters from the outset, the system achieves precise pattern formation matched to material requirements without requiring extensive post-processing adjustments, thereby maintaining high throughput.

Inventive Principle:

Principle #35Parameter changes

Data Source

PatentUS11567414B2Devices, systems, and methods for the hybrid generation of drop patterns

Publication Date: 2023.01.31 CANON KK

AI summary

Some devices, systems, and methods obtain a material map of a region; divide the region into a plurality of subregions; perform, for each of one or more subregions of the plurality of subregions, a first drop-pattern-generation process, wherein the first drop-pattern-generation process generates a respective initial drop pattern for the subregion based on the material map; and perform, for each of the one or more subregions of the plurality of subregions, a second drop-pattern-generation process, wherein the second drop-pattern-generation process generates a respective revised drop pattern for the subregion based on the material map and on the respective initial drop pattern for the subregion.