Hybrid Inductive Capacitive Plasma Generator

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing plasma sources either lack the high ion density of inductively coupled plasmas (ICP) or the low ignition temperature and stability of capacitively coupled plasmas (CCP), preventing the creation of a device that combines the advantages of both.

Innovation Solution

A plasma generation device that simultaneously couples energy inductively and capacitively using a combination of ICP coils and CCP components, including a Faraday shield and dark space shield, allowing for independent frequency control and scalable plasma generation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If inductively coupled plasma (ICP) is used, then high ion density is achieved, but ignition temperature is high and stability is reduced

Engineering Contradiction:
Improveion densityVSAvoidplasma stability
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

The patent combines inductive coupling coils and capacitive coupling electrodes into a single plasma generation device. The inductive coupling provides high ion density while the capacitive coupling provides low ignition temperature and enhanced stability, resolving the contradiction between ion density and stability

Inventive Principle:
Principle #5Merging (Combining)

2Reliability

If capacitively coupled plasma (CCP) is used, then low ignition temperature and stability are achieved, but ion density is reduced

Engineering Contradiction:
Improveplasma stabilityVSAvoidion density
Core Design Contradiction:
ReliabilityVSQuantity of substance

Solution Approach 1:

The patent merges capacitive coupling electrodes with inductive coupling coils in a hybrid configuration. The capacitive coupling ensures low ignition temperature and stability while the inductive coupling simultaneously provides high ion density, resolving the contradiction between stability and ion density

Inventive Principle:
Principle #5Merging (Combining)

3Area of stationary object

If ICP source design is used, then large area plasma is generated, but device complexity increases due to magnetic pole shoe arrangements

Engineering Contradiction:
Improveplasma areaVSAvoidmagnetic field concentration structure
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The patent integrates magnetic pole shoes directly into the capacitive coupling electrode structure, creating a unified component that performs both capacitive coupling and magnetic field concentration functions. This merging reduces device complexity while maintaining large area plasma generation capability

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device achieves high plasma density with controlled ion movement and excitation, enabling efficient plasma processing without standing-wave issues, suitable for applications like solar cell production and coating, while maintaining stability and ease of operation.

Implementation Method 1

at least one inductive device for inductively coupling energy into the plasma

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 2

at least one capacitive device for capacitively coupling energy into the plasma

Methodology Applied
Scientific EffectCapacitive coupling: Capacitance

Data Source

PatentUS9984857B2Plasma generation device
Publication Date: 2018.05.29 MEYER BURGER (GERMANY) GMBH
  • US9984857B2 patent drawing
  • US9984857B2 patent drawing
  • US9984857B2 patent drawing

AI summary

The subject matter of the instant invention is a plasma generation device in which at least one inductive device and at least one capacitive device are provided for coupling energy into a plasma in a plasma chamber. The at least one inductive device and the at least one capacitive device can be supplied with energy separately from one another by different frequency generators or by a common frequency generator.